Title :
Experimental investigations of hotspots in a low energy plasma focus operating in hydrogen-argon mixtures
Author :
Favre, Mario ; Silva, Patricio ; Choi, Peter ; Chuaqui, Hernán ; Dumitrescu-Zoita, Carmen ; Wyndham, Edmund S.
Author_Institution :
Fac. de Fisica, Pontificia Univ. Catolica de Chile, Santiago, Chile
fDate :
8/1/1998 12:00:00 AM
Abstract :
We present experimental results on the investigation of hotspot formation in PFP-I, a small 3.8 kJ plasma focus device operating in hydrogen-argon mixtures, at pressures from below 0.2 torr upward. A combination of multipinhole and slit-wire X-ray photography is used to measure the characteristic size and temperature of the hotspots, over a range of pressure and gas mixing ratios. Filtered p-i-n diodes and a beam-target detector are used to investigate the time evolution of the hotspots. Typical size for the hottest emitting region, at temperatures between 200 and 400 eV, is found to be around 150 μm, with a typical duration of the high temperature phase of the order of 10 ns. In general, the temperature in the final phase of the time evolution of the hotspots reaches values which are nearly twice those of the plasma column where they are formed. Characteristic size of the hotspots is about half of that of the initial plasma column
Keywords :
Z pinch; argon; gas mixtures; hydrogen; plasma diagnostics; plasma focus; 0.2 torr; 10 ns; 150 mum; 200 to 400 eV; 3.8 kJ; H2-Ar; H2-Ar mixtures; PFP-I plasma focus device; beam-target detector; characteristic size; dense Z-pinch; emitting region; filtered p-i-n diodes; gas mixing ratios; high temperature phase; hotspot formation; initial plasma column; low energy plasma focus; micropinches; multipinhole X-ray photography; pressure ratios; slit-wire X-ray photography; time evolution; transient plasmas; P-i-n diodes; Photography; Plasma devices; Plasma measurements; Plasma properties; Plasma temperature; Plasma x-ray sources; Pressure measurement; Size measurement; Temperature distribution;
Journal_Title :
Plasma Science, IEEE Transactions on