Title :
Using atomic force microscopy for deep submicron failure analysis
Author :
Lo, Jien-Chung ; Armitage, William D. ; Johnson, Corbet S., III
Author_Institution :
Dept. of Electr. & Comput. Eng., Rhode Island Univ., Kingston, RI, USA
Abstract :
As circuit feature size continues to shrink, we will soon need a failure analysis technique that provides resolutions of 10 nanometers or less. This feasibility study concludes that AFM technology, with reasonable improvements, can take over where focused ion beams leave off
Keywords :
VLSI; atomic force microscopy; circuit testing; failure analysis; AFM technology; atomic force microscopy; deep submicron failure analysis; Atomic force microscopy; Atomic layer deposition; Circuits; Educational institutions; Electron beams; Failure analysis; Focusing; Image resolution; Ion beams; Probes;
Journal_Title :
Design & Test of Computers, IEEE
