DocumentCode :
1438812
Title :
Empirical modeling of LF gate noise in GaAs DCFET in impact ionization regime
Author :
Lambert, Benoît ; Malbert, Nathalie ; Labat, Nathalie ; Verdier, Frédéric ; Touboul, André
Author_Institution :
IXL Lab., Bordeaux Univ., Talence, France
Volume :
22
Issue :
2
fYear :
2001
Firstpage :
50
Lastpage :
52
Abstract :
The evolution of the 1/f gate noise in GaAs DCFET has been analyzed in the impact ionization regime. As the drain bias Vd is raised, a steep increase of the 1/f gate current noise is observed in correlation with the triggering of the impact ionization mechanism. A novel and empirical model of the 1/f low frequency gate current noise S/sub ig/ measured in the impact ionization regime is proposed. The following relation fits it with an exponential law: S/sub ig/=E exp (-F/Vd) (1/f), which is similar to the well-known dependence of the impact ionization rate /spl alpha/ on the drain bias.
Keywords :
1/f noise; III-V semiconductors; gallium arsenide; impact ionisation; microwave field effect transistors; semiconductor device models; semiconductor device noise; 1/f gate noise; DCFET; GaAs; LF gate noise; drain bias; impact ionization regime; microwave FETs; Degradation; Frequency; Gallium arsenide; Hot carriers; Impact ionization; Low-frequency noise; MESFETs; Noise measurement; Testing; Threshold voltage;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/55.902828
Filename :
902828
Link To Document :
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