DocumentCode
1438945
Title
Physical origin of the excess thermal noise in short channel MOSFETs
Author
Goo, Jung-Suk ; Choi, Chang-Hoon ; Abramo, Antonio ; Ahn, Jae-Gyung ; Yu, Zhiping ; Lee, Thomas H. ; Dutton, Robert W.
Author_Institution
Center for Integrated Syst., Stanford Univ., CA, USA
Volume
22
Issue
2
fYear
2001
Firstpage
101
Lastpage
103
Abstract
The physical origin of the excess thermal noise in short channel MOSFETs is explained based on numerical noise simulation. The impedance field representation and extraction method demonstrate that the drain current noise is dominated by source side contributions. Analysis identifies local ac channel resistance variations as the primary controlling factor. The nonlocal nature of velocity results in a smaller derivative of the velocity with respect to the field which in turn causes a higher local ac resistance near the source junction.
Keywords
MOSFET; current fluctuations; semiconductor device models; semiconductor device noise; thermal noise; drain current noise; excess thermal noise; extraction method; hydrodynamic model; impedance field representation; local ac channel resistance variations; nonlocal velocity; numerical noise simulation; physical origin; short channel MOSFETs; source junction; source side contributions; Active noise reduction; Biomedical electrodes; Circuit simulation; High definition video; Impedance; MOSFETs; Medical simulation; Numerical simulation; Semiconductor device noise; Voltage;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/55.902845
Filename
902845
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