DocumentCode :
1438945
Title :
Physical origin of the excess thermal noise in short channel MOSFETs
Author :
Goo, Jung-Suk ; Choi, Chang-Hoon ; Abramo, Antonio ; Ahn, Jae-Gyung ; Yu, Zhiping ; Lee, Thomas H. ; Dutton, Robert W.
Author_Institution :
Center for Integrated Syst., Stanford Univ., CA, USA
Volume :
22
Issue :
2
fYear :
2001
Firstpage :
101
Lastpage :
103
Abstract :
The physical origin of the excess thermal noise in short channel MOSFETs is explained based on numerical noise simulation. The impedance field representation and extraction method demonstrate that the drain current noise is dominated by source side contributions. Analysis identifies local ac channel resistance variations as the primary controlling factor. The nonlocal nature of velocity results in a smaller derivative of the velocity with respect to the field which in turn causes a higher local ac resistance near the source junction.
Keywords :
MOSFET; current fluctuations; semiconductor device models; semiconductor device noise; thermal noise; drain current noise; excess thermal noise; extraction method; hydrodynamic model; impedance field representation; local ac channel resistance variations; nonlocal velocity; numerical noise simulation; physical origin; short channel MOSFETs; source junction; source side contributions; Active noise reduction; Biomedical electrodes; Circuit simulation; High definition video; Impedance; MOSFETs; Medical simulation; Numerical simulation; Semiconductor device noise; Voltage;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/55.902845
Filename :
902845
Link To Document :
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