• DocumentCode
    1438945
  • Title

    Physical origin of the excess thermal noise in short channel MOSFETs

  • Author

    Goo, Jung-Suk ; Choi, Chang-Hoon ; Abramo, Antonio ; Ahn, Jae-Gyung ; Yu, Zhiping ; Lee, Thomas H. ; Dutton, Robert W.

  • Author_Institution
    Center for Integrated Syst., Stanford Univ., CA, USA
  • Volume
    22
  • Issue
    2
  • fYear
    2001
  • Firstpage
    101
  • Lastpage
    103
  • Abstract
    The physical origin of the excess thermal noise in short channel MOSFETs is explained based on numerical noise simulation. The impedance field representation and extraction method demonstrate that the drain current noise is dominated by source side contributions. Analysis identifies local ac channel resistance variations as the primary controlling factor. The nonlocal nature of velocity results in a smaller derivative of the velocity with respect to the field which in turn causes a higher local ac resistance near the source junction.
  • Keywords
    MOSFET; current fluctuations; semiconductor device models; semiconductor device noise; thermal noise; drain current noise; excess thermal noise; extraction method; hydrodynamic model; impedance field representation; local ac channel resistance variations; nonlocal velocity; numerical noise simulation; physical origin; short channel MOSFETs; source junction; source side contributions; Active noise reduction; Biomedical electrodes; Circuit simulation; High definition video; Impedance; MOSFETs; Medical simulation; Numerical simulation; Semiconductor device noise; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/55.902845
  • Filename
    902845