DocumentCode :
1440415
Title :
Design of a microengineered electrostatic quadrupole lens
Author :
Syms, Richard R A ; Tate, Thomas J. ; Ahmad, Munir M. ; Taylor, Stephen
Author_Institution :
Dept. of Electr. & Electron. Eng., Imperial Coll., London, UK
Volume :
45
Issue :
11
fYear :
1998
fDate :
11/1/1998 12:00:00 AM
Firstpage :
2304
Lastpage :
2311
Abstract :
The design of a miniature quadrupole lens based on metallized glass electrodes mounted in two anisotropically etched silicon mounts that are separated by precision spacers is described. The analysis of conventional quadrupole lenses is first reviewed. The fabrication process is then described, and the analysis techniques are applied to the new geometry. The potential distribution near the axis is first calculated using a finite difference method. Expansion into solutions of Laplace´s equation in cylindrical coordinates is then used to determine the potential distortion introduced by the microengineered mount. Design rules are given for a mount and an electrode radius that achieve minimal distortion
Keywords :
Laplace equations; electrostatic lenses; etching; finite difference methods; mass spectrometers; microelectrodes; micromachining; silicon; voltage distribution; Laplace equation; Si; anisotropically etched Si mounts; cylindrical coordinates; design rules; electrode radius; fabrication process; finite difference method; metallized glass electrodes; microengineered electrostatic quadrupole lens; potential distortion; potential distribution; precision spacers; Anisotropic magnetoresistance; Electrodes; Electrostatics; Etching; Fabrication; Glass; Lenses; Metallization; Optical design; Silicon;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.726645
Filename :
726645
Link To Document :
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