DocumentCode :
1440532
Title :
Wafer fusion of infrared laser diodes to GaN light-emitting heterostructures
Author :
Floyd, P.D. ; Chua, C.L. ; Treat, D.W. ; Bour, D.P.
Author_Institution :
Electron. Mater. Lab., Xerox Palo Alto Res. Center, CA, USA
Volume :
10
Issue :
11
fYear :
1998
Firstpage :
1539
Lastpage :
1541
Abstract :
We use wafer fusion to integrate AlGaInAs quantum-well (QW) laser heterostructures to GaN laser diode and light-emitting diode (LED) structures. After fusion of the laser heterostructure to the GaN layers, AlGaInAs QW lasers are fabricated and characterized. Lasers of 15×510 μm operate with a threshold of 20 mA and external differential quantum efficiency of 15.5%/facet at a wavelength of 820 nm, InGaN-GaN LED´s, fabricated 75 μm from the lasers, emit at 458 nm. The operation of the lasers and LED´s fused to GaN demonstrates that the fused interface is mechanically robust, and the properties of fused heterostructures are not adversely affected by the fusion process.
Keywords :
III-V semiconductors; gallium compounds; indium compounds; integrated optoelectronics; laser transitions; light emitting diodes; optical fabrication; semiconductor lasers; wafer bonding; 15 mum; 458 nm; 510 mum; 820 nm; AlGaInAs; AlGaInAs QW laser fabrication; AlGaInAs quantum-well laser heterostructures; GaN; GaN layers; GaN light-emitting heterostructures; InGaN-GaN; InGaN-GaN LED; LED; external differential quantum efficiency; fused heterostructures; fused interface; fusion process; infrared laser diodes; light-emitting diode; mechanically robust; wafer fusion; Diode lasers; Gallium arsenide; Gallium nitride; Laser fusion; Lattices; Light emitting diodes; Optical materials; Quantum well lasers; Surface emitting lasers; Waveguide lasers;
fLanguage :
English
Journal_Title :
Photonics Technology Letters, IEEE
Publisher :
ieee
ISSN :
1041-1135
Type :
jour
DOI :
10.1109/68.726742
Filename :
726742
Link To Document :
بازگشت