• DocumentCode
    1441450
  • Title

    Influence of stress on rotational loss in silicon iron

  • Author

    Basak, A. ; Moses, A.J.

  • Author_Institution
    University College Cardiff, Department of Electrical and Electronic Engineering, Wolfson Centre for Magnetics Technology, Cardiff, UK
  • Volume
    125
  • Issue
    2
  • fYear
    1978
  • fDate
    2/1/1978 12:00:00 AM
  • Firstpage
    165
  • Lastpage
    168
  • Abstract
    The stress sensitivity of rotational-power loss in silicon iron has been investigated. The loss increases with tensile stress applied parallel to the rolling direction and decreases with compression. The opposite occurs when the stress is applied perpendicular to the rolling direction. The loss varies in a similar fashion over the flux-density range investigated. Increasing the frequency causes the loss to rise drastically and also increases its stress sensitivity. It has also been shown theoretically that the angle of lag of the flux density behind the applied field increases with stress and varies during the magnetising cycle.
  • Keywords
    iron alloys; laminations; magnetic cores; magnetic leakage; silicon alloys; stress effects; flux density; magnetising cycle; rotational loss; silicon iron; stress;
  • fLanguage
    English
  • Journal_Title
    Electrical Engineers, Proceedings of the Institution of
  • Publisher
    iet
  • ISSN
    0020-3270
  • Type

    jour

  • DOI
    10.1049/piee.1978.0045
  • Filename
    5253247