DocumentCode
1441450
Title
Influence of stress on rotational loss in silicon iron
Author
Basak, A. ; Moses, A.J.
Author_Institution
University College Cardiff, Department of Electrical and Electronic Engineering, Wolfson Centre for Magnetics Technology, Cardiff, UK
Volume
125
Issue
2
fYear
1978
fDate
2/1/1978 12:00:00 AM
Firstpage
165
Lastpage
168
Abstract
The stress sensitivity of rotational-power loss in silicon iron has been investigated. The loss increases with tensile stress applied parallel to the rolling direction and decreases with compression. The opposite occurs when the stress is applied perpendicular to the rolling direction. The loss varies in a similar fashion over the flux-density range investigated. Increasing the frequency causes the loss to rise drastically and also increases its stress sensitivity. It has also been shown theoretically that the angle of lag of the flux density behind the applied field increases with stress and varies during the magnetising cycle.
Keywords
iron alloys; laminations; magnetic cores; magnetic leakage; silicon alloys; stress effects; flux density; magnetising cycle; rotational loss; silicon iron; stress;
fLanguage
English
Journal_Title
Electrical Engineers, Proceedings of the Institution of
Publisher
iet
ISSN
0020-3270
Type
jour
DOI
10.1049/piee.1978.0045
Filename
5253247
Link To Document