Title :
Effect of Varied Undoped GaN Thickness on ESD and Optical Properties of GaN-Based LEDs
Author :
Chiang, Tsung-Hsun ; Wang, Chun-Kai ; Chang, Shoou-Jinn ; Chiou, Yu-Zung ; Ko, Tsun-Kai ; Lin, Tien-Kun ; Chang, Sheng-Po
Author_Institution :
Dept. of Electr. Eng., Nat. Cheng Kung Univ., Tainan, Taiwan
fDate :
5/15/2012 12:00:00 AM
Abstract :
The optical property and electrostatic discharge (ESD) endurance of GaN-based light-emitting diodes (LEDs) with varied undoped GaN thickness are studied and demonstrated. As the undoped GaN thickness increased, the generation of V-shaped defects in the active region was suppressed. Therefore, the output power for a 6-μ.m-thick undoped GaN layer would be enhanced remarkably due to the reduction of nonradiative recombination ratio within the active region. On the other hand, under a reverse ESD pulse voltage of 5.5 kV, the survival rate of the LEDs with an undoped GaN layer thickness of 1.5, 4, and 6 μm were 75%, 65%, and 55%, respectively. It was found that the ESD endurance for a 1.5-μ.m-thick undoped GaN layer with higher internal capacitance was obviously better than others. This could be related to the built-in electric field of LEDs induced by spontaneous polarization field.
Keywords :
III-V semiconductors; electrostatic discharge; gallium compounds; light emitting diodes; wide band gap semiconductors; GaN; V-shaped defects; active region; electrostatic discharge; internal capacitance; light emitting diodes; nonradiative recombination ratio; size 1.5 mum; size 4 mum; size 6 mum; spontaneous polarization field; undoped GaN thickness; voltage 5.5 kV; Capacitance; Current measurement; Electrostatic discharges; Gallium nitride; Light emitting diodes; Power generation; Semiconductor device measurement; Electrostatic discharge (ESD); GaN-based light-emitting diodes; nonradiative recombination; output power; spontaneous polarization field;
Journal_Title :
Photonics Technology Letters, IEEE
DOI :
10.1109/LPT.2012.2186563