DocumentCode
1444194
Title
Scanning Thermal Microscopy for Fast Multiscale Imaging and Manipulation
Author
Cannara, Rachel J. ; Sebastian, Abu ; Gotsmann, Bernd ; Rothuizen, Hugo
Author_Institution
IBM Zurich Res. Lab., Rüschlikon, Switzerland
Volume
9
Issue
6
fYear
2010
Firstpage
745
Lastpage
753
Abstract
Multiscale resolution imaging and manipulation are essential for applications ranging from defect screening in circuits to nanoscale manipulation, patterning, and lithography. In this paper, we introduce a variant of scanning thermal microscopy to image surfaces at both the micro- and nanoscale. Electrothermal imaging at the microscale is performed in a completely out-of-contact, i.e., “noncontact” or “off-contact,” mode with a microscale heater, followed by higher resolution nanoscale imaging in contact mode with a nanoscale probe tip. Using this methodology, the imaging and manipulation functions of a single probe can be decoupled completely. This off-contact imaging mode is useful for avoiding tip wear and can be performed safely at high velocities. We demonstrate imaging of microscale features at speeds of up to 2 mm/s. The lateral resolution is determined by the dimensions of the heater used for imaging. For the flying heights and heater dimensions used here, the 1-σ lateral spatial resolution limit in the off-contact mode is less than 10 μm for 10-nm-tall features. A silicon nanowire attached to microscale electrodes is imaged to demonstrate the efficacy of this scheme.
Keywords
infrared imaging; scanning probe microscopy; surface topography; 1-σ lateral spatial resolution limit; defect screening; electrothermal imaging; fast multiscale imaging; heater dimensions; higher resolution nanoscale imaging; lateral resolution; lithography; microscale electrodes; microscale heater; multiscale resolution imaging; nanoscale manipulation; nanoscale probe tip; off-contact imaging mode; patterning; scanning thermal microscopy; silicon nanowire; Circuits; Electrodes; Electrothermal effects; High-resolution imaging; Image resolution; Lithography; Microscopy; Probes; Silicon; Spatial resolution; Metrology; microfabricated probes; multiscale imaging; nanomanipulation; noncontact imaging; thermal sensing;
fLanguage
English
Journal_Title
Nanotechnology, IEEE Transactions on
Publisher
ieee
ISSN
1536-125X
Type
jour
DOI
10.1109/TNANO.2010.2045232
Filename
5433031
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