• DocumentCode
    1444756
  • Title

    Initiation of arc cathode emission in Cu2O films

  • Author

    Rageh, M.S.I. ; Guile, A.E. ; Morgan, D.V. ; Hitchcock, A.H.

  • Author_Institution
    University of Leeds, Department of Electrical & Electronic Engineering, Leeds, UK
  • Volume
    125
  • Issue
    1
  • fYear
    1978
  • fDate
    1/1/1978 12:00:00 AM
  • Firstpage
    81
  • Lastpage
    84
  • Abstract
    Experiments on Cu2O films over a wide thickness range are described in which three techniques have been used: (a) photo-electron-emission measurements in vacuum (b) I/V characteristics using a metal top electrode on the film (c) surface potential-difference measurements. These results have been correlated with scanning electron-micro-scope studies of copper-arc cathode microstructure to give new data on the initiation of electron emission. Ultra-violet radiation is shown to make possible switching times as low as 1 ns by increasing the electrical conductivity of the oxide film, but the electric field across the oxide required to produce switching depends on positive ion charging.
  • Keywords
    arcs (electric); copper compounds; electron emission; insulating thin films; photoemission; Cu arc cathode microstructure; Cu2O films; arc cathode emission; electron emission; insulating thin film;
  • fLanguage
    English
  • Journal_Title
    Electrical Engineers, Proceedings of the Institution of
  • Publisher
    iet
  • ISSN
    0020-3270
  • Type

    jour

  • DOI
    10.1049/piee.1978.0024
  • Filename
    5253776