Title :
Film deposition by laser-induced vacuum arc evaporation
Author :
Scheibe, H.-J. ; Siemroth, P.
Author_Institution :
Zentralinst. fuer Festkorperphys. und Werkstofforschung, Akad. der Wissenschaften, Dresden, East Germany
fDate :
12/1/1990 12:00:00 AM
Abstract :
Recent results of a study of the deposition process and the technological development of laser-arc are presented. Studies of the influence of arc current on film deposition were carried out for Ti, TiC, and C. On the basis of these results, specific multilayered structures have been prepared. As an example, a Ti/TiC multilayer system with 25-nm single layers is described. Results of structural and chemical analysis by means of Auger electron spectroscopy (AES) are presented. They show that diamond-like carbon film with a refractive index in the range of between 2.05 and 2.5 can be deposited effectively
Keywords :
Auger effect; arcs (electric); laser beam applications; vacuum deposition; 25 nm; Auger electron spectroscopy; C; Ti; TiC; film deposition; laser-arc; laser-induced vacuum arc evaporation; multilayers; Cathodes; Chemical analysis; Chemical vapor deposition; Energy efficiency; Optical films; Plasma density; Pulsed laser deposition; Substrates; Vacuum arcs; Vacuum technology;
Journal_Title :
Plasma Science, IEEE Transactions on
