Title :
Deposition of plasma-polymerized acetylene by an intense pulsed RF plasma source
Author :
Pedrow, Patrick D. ; Nasiruddin, Abutaher M. ; Mahalingam, R.
Author_Institution :
Washington State Univ., Pullman, WA, USA
fDate :
12/1/1990 12:00:00 AM
Abstract :
An inductively coupled, intense, pulsed RF plasma source deposited plasma-polymerized acetylene at a rate of 127 Å per discharge. The potassium bromide substrate was located 18-cm downstream from the RF coil. A puff valve admitted parent acetylene gas just before the transient RF current was applied. Fourier transform infrared (FTIR) spectra showed that carbon-to-carbon double bonds were formed. Scanning-electron-microscope images showed that the film thickness after 79 discharges was 1 μm. A photodiode showed substantial light emission for about 30 μs during each discharge
Keywords :
organic compounds; plasma deposition; scanning electron microscope examination of materials; thickness measurement; 1 micron; 127 Å; 30 mus; C=C double bonds; Fourier transform IR spectra; ICP; KBr substrate; RF coil; discharges; film thickness; light emission; photodiode; plasma-polymerized acetylene; polyacetylene; puff valve; pulsed RF plasma source; scanning electron microscope; transient RF current; Coils; Fault location; Particle production; Photodiodes; Plasma devices; Plasma properties; Plasma sources; Radio frequency; Substrates; Valves;
Journal_Title :
Plasma Science, IEEE Transactions on
