Title :
In-Plane-Gate Oxide-Based Thin-Film Transistors Self-Aligned on Stacked Self-Assembled Monolayer/
Electrolyte Dielectrics
Author :
Wu, Guodong ; Zhang, Hongliang ; Zhu, Liqiang ; Dai, Mingzhi ; Cui, Ping ; Wan, Qing
Author_Institution :
Ningbo Inst. of Mater. Technol. & Eng., Ningbo, China
fDate :
4/1/2012 12:00:00 AM
Abstract :
Low-voltage oxide-based thin-film transistors (TFTs) gated by stacked self-assembled octadecylphonic acid (ODPA) monolayer/SiO2 electrolyte with an in-plane-gate structure are self-aligned by one nickel shadow mask at room temperature. The stacked gate dielectrics show a reduced gate leakage current with the aid of the well-organized dense-stacked ODPA monolayer buffer. The equivalent field-effect mobility, subthreshold voltage swing, and drain current on/off ratio of such TFTs are estimated to be 11 cm2/V·s, 140 mV/dec, and 106, respectively. Such low-voltage in-plane-gate TFTs are very promising for low-cost portable sensors.
Keywords :
field effect transistors; leakage currents; low-power electronics; masks; monolayers; organic compounds; self-assembly; silicon compounds; thin film transistors; SiO2; drain current on/off ratio; electrolyte dielectrics; equivalent field-effect mobility; in-plane-gate oxide-based thin-film transistors; in-plane-gate structure; low-cost portable sensors; low-voltage in-plane-gate TFT; low-voltage oxide-based thin-film transistors; one nickel shadow mask; reduced gate leakage current; silica electrolyte; stacked gate dielectrics; stacked self-assembled monolayer; stacked self-assembled octadecylphonic acid monolayer; subthreshold voltage swing; well-organized dense-stacked ODPA monolayer buffer; Capacitance; Dielectrics; Indium tin oxide; Leakage current; Logic gates; Thin film transistors; In-plane gate; monolayer/$hbox{SiO}_{2}$ electrolyte; self-assembly;
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/LED.2012.2182756