Title :
Optical-Damage-Resistant MgO-Diffused Near-Stoichiometric
Strip Waveguides
Author :
Hua, Ping-Rang ; Zhang, Shuai ; Dong, Na ; Yu, Dao-Yin ; Pun, Edwin Yue-Bun ; Zhang, De-Long
Author_Institution :
Sch. of Precision Instrum. & Optoelectron. Eng., Tianjin Univ., Tianjin, China
fDate :
3/15/2012 12:00:00 AM
Abstract :
We report near-stoichiometric (NS) Ti:Mg:LiNbO3 strip waveguides fabricated starting from a Z-cut pure congruent LiNbO3 substrate in sequence by Tiand MgO-diffusion and post vapor transport equilibration. These waveguides with an initial Ti-strip width of 4-8 μ.m well support transverse magnetic mode, are single-mode at 0.98and 1.5-μ.m wavelengths, have a smooth surface and a loss as low as 0.1 dB/cm at 1.5 μm. The waveguides are NS and optical-damage-resistant, and have a homogeneous Mg concentration of 1.7 ± 0.3 mol% in the guiding layer. Such a waveguide is promising for nonlinear integrated optics.
Keywords :
lithium compounds; magnesium compounds; nonlinear optics; optical fabrication; optical waveguides; titanium; LiNbO3:Mg; LiNbO3:Ti; MgO; Z-cut pure congruent substrate; diffusion; nonlinear integrated optics; optical-damage-resistant-diffused near-stoichiometric strip waveguides; post vapor transport equilibration; size 4 mum to 8 mum; transverse magnetic mode; wavelength 0.98 mum; wavelength 1.5 mum; Frequency conversion; Lithium niobate; Optical device fabrication; Optical surface waves; Optical waveguides; Strips; Surface waves; ${rm Ti{:}Mg{:}LiNbO}_{3}$ waveguide; MgO-diffusion; near-stoichiometric (NS); photorefractive effect;
Journal_Title :
Photonics Technology Letters, IEEE
DOI :
10.1109/LPT.2011.2182607