DocumentCode :
1446160
Title :
Performance predictions for n-p-n AlxGa1-xN/GaN HBTs
Author :
Pulfrey, David L. ; Fathpour, Sasan
Author_Institution :
Dept. of Electr. & Comput. Eng., British Columbia Univ., Vancouver, BC, Canada
Volume :
48
Issue :
3
fYear :
2001
fDate :
3/1/2001 12:00:00 AM
Firstpage :
597
Lastpage :
602
Abstract :
Predictions of the attainable current gain and cut-off frequency of n-p-n AlxGa1-xN/GaN HBTs are made using compact models. This analytical approach allows the minority-carrier lifetime in the base to be readily identified as a critical parameter in the determination of the gain. For realistic values of lifetime, room-temperature gains in the region of 200-2000 should be attainable, with a graded-base being necessary for highest performance. Gains around 100 are predicted for operation at 600 K. Design of the base is shown to be also important in attaining high cutoff frequencies: a value around 30 GHz would appear to be the upper limit, and its realization would need a graded-base device. Spontaneous polarization is shown to be unlikely to have a major impact on device performance. On the other hand, incomplete ionization of the base dopant is shown to be an important factor
Keywords :
III-V semiconductors; aluminium compounds; carrier lifetime; gallium compounds; heterojunction bipolar transistors; minority carriers; semiconductor device models; wide band gap semiconductors; 30 GHz; 600 K; AlGaN-GaN; analytical model; current gain; cut-off frequency; dopant ionization; graded base device; minority carrier lifetime; n-p-n AlxGa1-xN/GaN HBT; spontaneous polarization; Bipolar transistors; Cutoff frequency; Electrons; Gallium nitride; Heterojunction bipolar transistors; Ionization; Numerical models; Performance gain; Photonic band gap; Polarization;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.906457
Filename :
906457
Link To Document :
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