Title :
Magnetron sputtering of CoCr/Cr and CoCrTa/Cr on flexible substrates
Author :
Veldeman, J. ; Jia, H. ; Burgelman, M.
Author_Institution :
Ghent Univ., Belgium
fDate :
9/1/2000 12:00:00 AM
Abstract :
In this paper a new method is developed to deposit magnetic films on flexible substrates. The magnetron sputter process commonly used in hard disk technology is adapted to the specific needs of flexible substrates. By using a higher sputter pressure and no substrate heating the problem of substrate stress or deformation is solved. The influence of all major sputter parameters is discussed in this article. All samples mere characterized by magnetic measurements [hysteresis curve (H c, Mr, Ms), remanence and δM measurements], and by XRD and AFM
Keywords :
X-ray diffraction; atomic force microscopy; chromium; chromium alloys; cobalt alloys; hard discs; magnetic hysteresis; magnetic multilayers; magnetic recording; remanence; sputter deposition; tantalum alloys; AFM; CoCr-Cr; CoCrTa-Cr; X-diffraction; atomic force microscopy; flexible substrates; hard disk; hysteresis curve; magnetic films; magnetron sputtering; remanence; substrate deformation; substrate stress; Chromium; Hard disks; Heating; Magnetic films; Magnetic hysteresis; Magnetic variables measurement; Remanence; Sputtering; Stress; X-ray scattering;
Journal_Title :
Magnetics, IEEE Transactions on
