DocumentCode :
1448206
Title :
Hole Effective Masses as a Booster of Self-Consistent Six-Band k \\cdot p Simulation in Inversion Layers of pMOSFETs
Author :
Chen, Ming-Jer ; Lee, Chien-Chih ; Cheng, Kuan-Hao
Author_Institution :
Dept. of Electron. Eng., Nat. Chiao Tung Univ., Hsinchu, Taiwan
Volume :
58
Issue :
4
fYear :
2011
fDate :
4/1/2011 12:00:00 AM
Firstpage :
931
Lastpage :
937
Abstract :
Self-consistently solving the Schrödinger and Poisson´s equations in the six-band k.p context can yield the valence-band structure in the inversion layers of pMOSFETs. In this numerically demanding process, the central processing unit (CPU) time is extraordinarily long. To overcome the hurdle, we construct a novel computational accelerator to intrinsically boost a self-consistent six-band k.p simulation. This accelerator comprises a triangular-potential-based six-band k.p simulator, a hole effective mass approximation (EMA) technique, and an electron analogy version of the self-consistent Schrödinger and Poisson´s equations solver. The outcome of the accelerator furnishes the initial solution of the confining electrostatic potential and is likely close to the realistic one, which is valid for different temperatures, substrate doping concentrations, inversion hole densities, and surface orientations. The results on (001) and (110) substrates are supported by those published in the literature. The overall CPU time is reduced down to around 8% of that without the accelerator. This is the first successful demonstration of the EMA in the self-consistent hole subband structure calculation. The application of the proposed accelerator to more general situations is projected as well.
Keywords :
MOSFET; Poisson equation; Schrodinger equation; approximation theory; electric potential; hole density; inversion layers; k.p calculations; semiconductor doping; valence bands; CPU time; Poisson equation; Schrodinger equation; booster; central processing unit; computational accelerator; electrostatic potential; hole effective mass approximation technique; inversion hole density; inversion layer; metal oxide semiconductor field-effect transistor; pMOSFET; self-consistent six-band k.p simulation; substrate doping concentration; triangular-potential-based six-band k.p simulator; valence-band structure; Computational modeling; Doping; Effective mass; Electrostatics; MOSFETs; Mathematical model; Substrates; Effective mass; Schrödinger and Poisson´s equations; hole; metal–oxide–semiconductor field-effect transistors (MOSFETs); model; simulation; two-dimensional hole gas (2DHG); valence-band structure;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2011.2105271
Filename :
5711657
Link To Document :
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