DocumentCode
1449625
Title
Comparison of two-wave and three-wave forward mixing in bismuth silicon oxide-theory and experiment
Author
Jones, D.C. ; Solymar, L.
Author_Institution
Dept. of Eng. Sci., Oxford Univ., UK
Volume
27
Issue
1
fYear
1991
fDate
1/1/1991 12:00:00 AM
Firstpage
121
Lastpage
127
Abstract
A comparison is made between the traditional two-wave amplification mechanism and a new mechanism that is due to forward three-wave mixing. It is found experimentally that considerably higher amplification is available using forward three-wave mixing. Experimental results are in good qualitative agreement with theory concerning dependence on frequency detuning and interbeam angle, but there is a discrepancy between experiment and theory relating to the magnitude of the gain obtainable by two-wave and three-wave mixing, respectively. It is suggested that an additional physical gain mechanism arising from large modulation effects should be included in the theory to account fully for the discrepancy between two-wave and three-wave results
Keywords
bismuth compounds; multiwave mixing; optical materials; Bi12SiO20; frequency detuning; interbeam angle; large modulation effects; three-wave forward mixing; two-wave amplification mechanism; two-wave forward mixing; Bismuth; Frequency; Gratings; Helium; Interference; Laser excitation; Liquid crystals; Nonlinear optics; Optical coupling; Silicon;
fLanguage
English
Journal_Title
Quantum Electronics, IEEE Journal of
Publisher
ieee
ISSN
0018-9197
Type
jour
DOI
10.1109/3.73549
Filename
73549
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