Dependence of magnetoelastic anistropy on Ni-sublayer thickness in Ni/Pd nanomultilayers

Author

Jeong, Jong-Ryul ; Shin, Sung-Chul

Author_Institution

Dept. of Phys., Korea Adv. Inst. of Sci. & Technol., Seoul, South Korea

Volume

36

Issue

5

fYear

2000

fDate

9/1/2000 12:00:00 AM

Firstpage

3229

Lastpage

3231

Abstract

We have investigated the dependence of magnetoelastic anisotropy energy on the Ni-sublayer thickness in Ni/Pd nanomultilayers to examine the contribution of magnetoelastic anisotropy to perpendicular magnetic anisotropy (PMA) observed in Ni/Pd nanomultilayers. Magnetoelastic anisotropy energy was quantitatively determined by delicate in situ stress and ex situ magnetostriction coefficient measurements. It was found that the magnetoelastic anisotropy for the samples prepared at 2-mTorr Ar sputtering pressure is largely dependent on the Ni-sublayer thickness: the magnetoelastic anisotropy is varied from 4.6×10⁵ to -0.8×10⁵ erg/cm³. However the magnetoelastic anisotropy for the samples prepared at 7 mTorr is nearly constant with varying the Ni sublayer thickness: the magnetoelastic anisotropy of 3.5(±0.7)×10⁵ erg/cm³ is observed, irrespective of the Ni-sublayer thickness

Keywords

magnetic multilayers; magnetoelastic effects; magnetostriction; nanostructured materials; nickel; palladium; perpendicular magnetic anisotropy; Ni-Pd; Ni-sublayer thickness; Ni/Pd nanomultilayers; magnetoelastic anistropy; magnetostriction coefficient; perpendicular magnetic anisotropy; Anisotropic magnetoresistance; Argon; Magnetic anisotropy; Magnetic films; Magnetic multilayers; Magnetostriction; Perpendicular magnetic anisotropy; Sputtering; Stress measurement; X-ray diffraction;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.908748

Filename

908748