DocumentCode :
1449862
Title :
A Highly Sensitive Optical Sensor Design by Integrating a Circular-Hole Defect With an Etched Diffraction Grating Spectrometer on an Amorphous-Silicon Photonic Chip
Author :
Song, J. ; Li, Y.Z. ; Zhou, X. ; Li, X.
Author_Institution :
Key Lab. of Optoelectron. Devices & Syst. of Minist. of Educ., Shenzhen Univ., Shenzhen, China
Volume :
4
Issue :
2
fYear :
2012
fDate :
4/1/2012 12:00:00 AM
Firstpage :
317
Lastpage :
326
Abstract :
We present a sensitive optical sensor design by integrating a circular-hole defect with an etched diffraction grating (EDG) spectrometer based on amorphous-silicon photonic platforms. The circular-hole defect obtained from the outdiffusion of the hydrogen in the annealing process can induce strong resonant scattering loss at some special wavelengths. The positions of resonant peaks will linearly shift with the refractive index change of the detected sample (the sensitivity is 9200 nm/RIU). In addition, the influences of the defect on the sensing characteristics are numerically analyzed based on a scalar diffraction method and a Green tensor technology.
Keywords :
Green´s function methods; amorphous semiconductors; annealing; diffraction gratings; optical design techniques; optical planar waveguides; optical sensors; refractive index; silicon; spectrometers; Green tensor; Si; amorphous-silicon photonic chip; annealing; circular-hole defect; etched diffraction grating spectrometer; optical sensor design; outdiffusion; refractive index change; resonant scattering loss; Diffraction; Optical sensors; Optical waveguides; Planar waveguides; Refractive index; Scattering; Sensors; silicon nanophotonics;
fLanguage :
English
Journal_Title :
Photonics Journal, IEEE
Publisher :
ieee
ISSN :
1943-0655
Type :
jour
DOI :
10.1109/JPHOT.2012.2188097
Filename :
6153091
Link To Document :
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