DocumentCode
1450212
Title
Quantifying neutral base recombination and the effects of collector-base junction traps in UHV/CVD SiGe HBTs
Author
Niu, Guofu ; Cressler, John D. ; Joseph, Alvin J.
Author_Institution
Dept. of Electr. Eng., Auburn Univ., AL, USA
Volume
45
Issue
12
fYear
1998
fDate
12/1/1998 12:00:00 AM
Firstpage
2499
Lastpage
2504
Abstract
This work quantifies neutral base recombination in UHV/CVD SiGe heterojunction bipolar transistors (HBTs) using calibrated two-dimensional (2-D) simulation. The simulated collector-base conductance through neutral base recombination (NBR) modulation is far below the experimentally observed values, and hence does not explain the measured output resistance degradation under forced-IB operation. In spite of the output resistance degradation, these UHV/CVD SiGe HBTs have approximately the same base current as the silicon control, and hence higher current gain. Based on the observation of the majority carrier concentration limited recombination in the CB junction depletion layer, as opposed to the minority carrier concentration limited recombination in the neutral base, local presence of traps in the CB junction depletion layer is suggested. This explains the measured CB conductance modulation and the related output resistance degradation without compromising the current gain. Numerical simulations using traps locally introduced into the CB junctions successfully reproduced the measured collector-base conductance from simulation without appreciable degradation in current gain
Keywords
CVD coatings; Ge-Si alloys; carrier density; electron traps; electron-hole recombination; heterojunction bipolar transistors; semiconductor device models; semiconductor materials; CB conductance modulation; SiGe; UHV/CVD SiGe HBT; base current; collector-base junction traps; current gain; depletion layer; heterojunction bipolar transistor; majority carrier concentration; minority carrier concentration; neutral base recombination; output resistance; two-dimensional numerical simulation; Current measurement; Degradation; Electrical resistance measurement; Force measurement; Gain measurement; Germanium silicon alloys; Heterojunction bipolar transistors; Numerical simulation; Silicon germanium; Two dimensional displays;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.735727
Filename
735727
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