• DocumentCode
    1450212
  • Title

    Quantifying neutral base recombination and the effects of collector-base junction traps in UHV/CVD SiGe HBTs

  • Author

    Niu, Guofu ; Cressler, John D. ; Joseph, Alvin J.

  • Author_Institution
    Dept. of Electr. Eng., Auburn Univ., AL, USA
  • Volume
    45
  • Issue
    12
  • fYear
    1998
  • fDate
    12/1/1998 12:00:00 AM
  • Firstpage
    2499
  • Lastpage
    2504
  • Abstract
    This work quantifies neutral base recombination in UHV/CVD SiGe heterojunction bipolar transistors (HBTs) using calibrated two-dimensional (2-D) simulation. The simulated collector-base conductance through neutral base recombination (NBR) modulation is far below the experimentally observed values, and hence does not explain the measured output resistance degradation under forced-IB operation. In spite of the output resistance degradation, these UHV/CVD SiGe HBTs have approximately the same base current as the silicon control, and hence higher current gain. Based on the observation of the majority carrier concentration limited recombination in the CB junction depletion layer, as opposed to the minority carrier concentration limited recombination in the neutral base, local presence of traps in the CB junction depletion layer is suggested. This explains the measured CB conductance modulation and the related output resistance degradation without compromising the current gain. Numerical simulations using traps locally introduced into the CB junctions successfully reproduced the measured collector-base conductance from simulation without appreciable degradation in current gain
  • Keywords
    CVD coatings; Ge-Si alloys; carrier density; electron traps; electron-hole recombination; heterojunction bipolar transistors; semiconductor device models; semiconductor materials; CB conductance modulation; SiGe; UHV/CVD SiGe HBT; base current; collector-base junction traps; current gain; depletion layer; heterojunction bipolar transistor; majority carrier concentration; minority carrier concentration; neutral base recombination; output resistance; two-dimensional numerical simulation; Current measurement; Degradation; Electrical resistance measurement; Force measurement; Gain measurement; Germanium silicon alloys; Heterojunction bipolar transistors; Numerical simulation; Silicon germanium; Two dimensional displays;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.735727
  • Filename
    735727