• DocumentCode
    1450524
  • Title

    Growth rate dependence of nitrogen incorporation in reactively sputtered FeXN films for recording head poles

  • Author

    Bain, James A. ; Pellerin, Kelly ; Chow, Jason T. ; Zou, Pei

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Carnegie Mellon Univ., Pittsburgh, PA, USA
  • Volume
    36
  • Issue
    5
  • fYear
    2000
  • fDate
    9/1/2000 12:00:00 AM
  • Firstpage
    3473
  • Lastpage
    3475
  • Abstract
    In this paper we show that the efficiency of nitrogen incorporation in reactively sputtered FeAlN and FeN films is strongly dependent on the growth rate of the films. Efficiency is defined as the amount of nitrogen incorporated for a given ratio of arriving iron atoms to arriving nitrogen atoms. These findings are in contrast to previous work, which has suggested the amount of nitrogen incorporated in the films should be determined by this arrival flux ratio alone, and independent of growth rate. This difference may be due to the larger range of deposition rates explored in this work. A simple and phenomenological kinetic model of the deposition process is used to rationalize the observed behavior. This behavior has important consequences for scaling the deposition of FeXN up to commercial deposition rates while maintaining soft magnetic properties. This is because the amount of nitrogen incorporated has a strong effect on the soft properties of these pole materials
  • Keywords
    aluminium alloys; iron alloys; iron compounds; magnetic heads; magnetic recording; magnetic thin films; soft magnetic materials; sputter deposition; sputtered coatings; FeAlN; FeN; N incorporation; arrival flux ratio; growth rate dependence; phenomenological kinetic model; reactively sputtered films; recording head poles; soft magnetic properties; Atomic layer deposition; Helium; Iron; Kinetic theory; Magnetic films; Magnetic heads; Magnetic materials; Nitrogen; Soft magnetic materials; Sputtering;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/20.908864
  • Filename
    908864