DocumentCode
1450524
Title
Growth rate dependence of nitrogen incorporation in reactively sputtered FeXN films for recording head poles
Author
Bain, James A. ; Pellerin, Kelly ; Chow, Jason T. ; Zou, Pei
Author_Institution
Dept. of Electr. & Comput. Eng., Carnegie Mellon Univ., Pittsburgh, PA, USA
Volume
36
Issue
5
fYear
2000
fDate
9/1/2000 12:00:00 AM
Firstpage
3473
Lastpage
3475
Abstract
In this paper we show that the efficiency of nitrogen incorporation in reactively sputtered FeAlN and FeN films is strongly dependent on the growth rate of the films. Efficiency is defined as the amount of nitrogen incorporated for a given ratio of arriving iron atoms to arriving nitrogen atoms. These findings are in contrast to previous work, which has suggested the amount of nitrogen incorporated in the films should be determined by this arrival flux ratio alone, and independent of growth rate. This difference may be due to the larger range of deposition rates explored in this work. A simple and phenomenological kinetic model of the deposition process is used to rationalize the observed behavior. This behavior has important consequences for scaling the deposition of FeXN up to commercial deposition rates while maintaining soft magnetic properties. This is because the amount of nitrogen incorporated has a strong effect on the soft properties of these pole materials
Keywords
aluminium alloys; iron alloys; iron compounds; magnetic heads; magnetic recording; magnetic thin films; soft magnetic materials; sputter deposition; sputtered coatings; FeAlN; FeN; N incorporation; arrival flux ratio; growth rate dependence; phenomenological kinetic model; reactively sputtered films; recording head poles; soft magnetic properties; Atomic layer deposition; Helium; Iron; Kinetic theory; Magnetic films; Magnetic heads; Magnetic materials; Nitrogen; Soft magnetic materials; Sputtering;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/20.908864
Filename
908864
Link To Document