Improved RF integrated magnetic thin-film inductors by means of micro slits and surface planarization techniques

Author

Yamaguchi, M. ; Baba, M. ; Suezawa, K. ; Moizumi, T. ; Arai, K.I. ; Haga, A. ; Shimada, Y. ; Tanabe, S. ; Itoh, K.

Author_Institution

Inst. of Electr. & Commun. Eng., Tohoku Univ., Sendai, Japan

Volume

36

Issue

5

fYear

2000

fDate

9/1/2000 12:00:00 AM

Firstpage

3495

Lastpage

3498

Abstract

Improvement of magnetic thin-film inductors for RF monolithic microwave integrated circuits (MMICs) is discussed. Surface planarization reduced the surface roughness down to R_a=1.2 nm, which enhanced the quality factor by 14% over a nonplanarized inductor. The orthogonal bar slit pattern was the best among the fabricated slit patterns, L=7.55 nH (+12% of the air core), R=6.80 Ω and Q=7.09 (+9%) were obtained for the orthogonal bar slit pattern (slit width=0.75 μm) with surface planarization

Keywords

MMIC; Q-factor; inductors; magnetic microwave devices; surface treatment; 0.75 micron; 6.80 ohm; MMICs; RF integrated magnetic thin-film inductors; micro slits; orthogonal bar slit pattern; quality factor; surface planarization techniques; surface roughness; MMICs; Magnetic films; Microwave integrated circuits; Monolithic integrated circuits; Planarization; Radio frequency; Radiofrequency integrated circuits; Rough surfaces; Surface roughness; Thin film inductors;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.908872

Filename

908872