Title :
Effects of Positive and Negative Stresses on III–V MOSFETs With
Gate Dielectric
Author :
Wrachien, N. ; Cester, A. ; Wu, Y.Q. ; Ye, P.D. ; Zanoni, E. ; Meneghesso, G.
Author_Institution :
Univ. of Padova, Padova, Italy
fDate :
4/1/2011 12:00:00 AM
Abstract :
We subjected III-V InGaAs MOSFETs to positive and negative gate stresses. The stress polarity strongly affects the degradation kinetics of the gate current. Positive stress features a remarkable increase of the gate current, a net negative trapped charge, a large telegraphic noise, and soft breakdown, before the occurrence of the final catastrophic breakdown. Negative stress features only positive trapped charge until the hard breakdown.
Keywords :
III-V semiconductors; MOSFET; aluminium compounds; dielectric devices; electric breakdown; stress effects; Al2O3; MOSFET; gate current; gate dielectric; negative stress; net negative trapped charge; positive stress; soft breakdown; stress polarity; telegraphic noise; Aluminum oxide; Dielectrics; Electric breakdown; Electron traps; Logic gates; MOSFETs; Stress; III–V MOSFET; reliability; stress;
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/LED.2011.2106107