• DocumentCode
    1450643
  • Title

    Effects of Positive and Negative Stresses on III–V MOSFETs With \\hbox {Al}_{2}\\hbox {O}_{3} Gate Dielectric

  • Author

    Wrachien, N. ; Cester, A. ; Wu, Y.Q. ; Ye, P.D. ; Zanoni, E. ; Meneghesso, G.

  • Author_Institution
    Univ. of Padova, Padova, Italy
  • Volume
    32
  • Issue
    4
  • fYear
    2011
  • fDate
    4/1/2011 12:00:00 AM
  • Firstpage
    488
  • Lastpage
    490
  • Abstract
    We subjected III-V InGaAs MOSFETs to positive and negative gate stresses. The stress polarity strongly affects the degradation kinetics of the gate current. Positive stress features a remarkable increase of the gate current, a net negative trapped charge, a large telegraphic noise, and soft breakdown, before the occurrence of the final catastrophic breakdown. Negative stress features only positive trapped charge until the hard breakdown.
  • Keywords
    III-V semiconductors; MOSFET; aluminium compounds; dielectric devices; electric breakdown; stress effects; Al2O3; MOSFET; gate current; gate dielectric; negative stress; net negative trapped charge; positive stress; soft breakdown; stress polarity; telegraphic noise; Aluminum oxide; Dielectrics; Electric breakdown; Electron traps; Logic gates; MOSFETs; Stress; III–V MOSFET; reliability; stress;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2011.2106107
  • Filename
    5713812