DocumentCode
1450643
Title
Effects of Positive and Negative Stresses on III–V MOSFETs With
Gate Dielectric
Author
Wrachien, N. ; Cester, A. ; Wu, Y.Q. ; Ye, P.D. ; Zanoni, E. ; Meneghesso, G.
Author_Institution
Univ. of Padova, Padova, Italy
Volume
32
Issue
4
fYear
2011
fDate
4/1/2011 12:00:00 AM
Firstpage
488
Lastpage
490
Abstract
We subjected III-V InGaAs MOSFETs to positive and negative gate stresses. The stress polarity strongly affects the degradation kinetics of the gate current. Positive stress features a remarkable increase of the gate current, a net negative trapped charge, a large telegraphic noise, and soft breakdown, before the occurrence of the final catastrophic breakdown. Negative stress features only positive trapped charge until the hard breakdown.
Keywords
III-V semiconductors; MOSFET; aluminium compounds; dielectric devices; electric breakdown; stress effects; Al2O3; MOSFET; gate current; gate dielectric; negative stress; net negative trapped charge; positive stress; soft breakdown; stress polarity; telegraphic noise; Aluminum oxide; Dielectrics; Electric breakdown; Electron traps; Logic gates; MOSFETs; Stress; III–V MOSFET; reliability; stress;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/LED.2011.2106107
Filename
5713812
Link To Document