• DocumentCode
    1452717
  • Title

    Read versus flat doping profile structures for the realization of reliable high-power, high-efficiency 94 GHz IMPATT sources

  • Author

    Dalle, Christophe ; Rolland, Paul-Alain

  • Author_Institution
    Univ. des Sci. & Tech. de Lille Flandres Artois, Villeneuve d´´Ascq, France
  • Volume
    38
  • Issue
    4
  • fYear
    1990
  • fDate
    4/1/1990 12:00:00 AM
  • Firstpage
    366
  • Lastpage
    372
  • Abstract
    An investigation of the potential RF performance of various types of silicon IMPATT homojunction structures was carried out to identify the most efficient type for reliable high-power, high-efficiency CW generation in the 94 GHz window. The study used an IMPATT oscillator model accounting, in a self-consistent manner, for both thermal limitation and diode impedance matching. The main result is that in contrast to lower operating frequencies, the realization of a Read doping profile does not improve the RF performance level compared to structures with a flat doping profile. Operating conditions were optimized for high RF emitted performance conditions. In addition, the fundamental effects on RF performance of both the diode thermal resistance and RF losses have been quantified
  • Keywords
    IMPATT diodes; doping profiles; elemental semiconductors; losses; microwave oscillators; semiconductor device models; semiconductor doping; silicon; thermal resistance; 94 GHz; EHF; IMPATT oscillator model; IMPATT sources; MM-wave device; RF losses; RF performance; Read doping profile; Si; diode impedance matching; diode thermal resistance; flat doping profile structures; high power semiconductor device; high-efficiency CW generation; homojunction structures; microwave device; millimetre wave operation; thermal limitation; Diodes; Doping profiles; Impedance matching; Oscillators; Performance loss; Radio frequency; Radiofrequency identification; Semiconductor process modeling; Silicon; Thermal resistance;
  • fLanguage
    English
  • Journal_Title
    Microwave Theory and Techniques, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9480
  • Type

    jour

  • DOI
    10.1109/22.52576
  • Filename
    52576