DocumentCode :
1453221
Title :
Simultaneous Technology Mapping and Placement for Delay Minimization
Author :
Liu, Yifang ; Shelar, Rupesh S. ; Hu, Jiang
Author_Institution :
Google Inc., Mountain View, CA, USA
Volume :
30
Issue :
3
fYear :
2011
fDate :
3/1/2011 12:00:00 AM
Firstpage :
416
Lastpage :
426
Abstract :
Technology mapping and placement have a significant impact on delays in standard cell-based very large scale integrated circuits. Traditionally, these steps are applied separately to optimize the delays, possibly since efficient algorithms that allow the simultaneous exploration of the mapping and placement solution spaces are unknown. In this paper, we present an exact polynomial time algorithm for delay-optimal placement of a tree and extend the same to simultaneous technology mapping and placement for the optimal delay in the tree. We extend the algorithm by employing Lagrangian relaxation technique, which assesses the timing criticality of paths beyond a tree, to optimize the delays in directed acyclic graphs. Experimental results on benchmark circuits in a 70 nm technology show that our algorithms improve timing significantly with remarkably less runtimes compared to a competitive approach of iterative conventional timing-driven mapping and multilevel placement.
Keywords :
VLSI; computational complexity; delays; directed graphs; minimisation; cell-based very large scale integrated circuits; delay minimization; delay-optimal placement; directed acyclic graphs; iterative conventional timing-driven mapping; multilevel placement; polynomial time algorithm; size 70 nm; technology mapping; technology placement; Algorithm design and analysis; Delay; Libraries; Load modeling; Minimization; Polynomials; Algorithms; directed acyclic graph; physical synthesis; placement; technology mapping; tree;
fLanguage :
English
Journal_Title :
Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on
Publisher :
ieee
ISSN :
0278-0070
Type :
jour
DOI :
10.1109/TCAD.2010.2089569
Filename :
5715609
Link To Document :
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