• DocumentCode
    1453221
  • Title

    Simultaneous Technology Mapping and Placement for Delay Minimization

  • Author

    Liu, Yifang ; Shelar, Rupesh S. ; Hu, Jiang

  • Author_Institution
    Google Inc., Mountain View, CA, USA
  • Volume
    30
  • Issue
    3
  • fYear
    2011
  • fDate
    3/1/2011 12:00:00 AM
  • Firstpage
    416
  • Lastpage
    426
  • Abstract
    Technology mapping and placement have a significant impact on delays in standard cell-based very large scale integrated circuits. Traditionally, these steps are applied separately to optimize the delays, possibly since efficient algorithms that allow the simultaneous exploration of the mapping and placement solution spaces are unknown. In this paper, we present an exact polynomial time algorithm for delay-optimal placement of a tree and extend the same to simultaneous technology mapping and placement for the optimal delay in the tree. We extend the algorithm by employing Lagrangian relaxation technique, which assesses the timing criticality of paths beyond a tree, to optimize the delays in directed acyclic graphs. Experimental results on benchmark circuits in a 70 nm technology show that our algorithms improve timing significantly with remarkably less runtimes compared to a competitive approach of iterative conventional timing-driven mapping and multilevel placement.
  • Keywords
    VLSI; computational complexity; delays; directed graphs; minimisation; cell-based very large scale integrated circuits; delay minimization; delay-optimal placement; directed acyclic graphs; iterative conventional timing-driven mapping; multilevel placement; polynomial time algorithm; size 70 nm; technology mapping; technology placement; Algorithm design and analysis; Delay; Libraries; Load modeling; Minimization; Polynomials; Algorithms; directed acyclic graph; physical synthesis; placement; technology mapping; tree;
  • fLanguage
    English
  • Journal_Title
    Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0278-0070
  • Type

    jour

  • DOI
    10.1109/TCAD.2010.2089569
  • Filename
    5715609