DocumentCode
1453688
Title
Measurement of facet reflectivity of antireflection-coated electroabsorption modulator using induced photocurrent
Author
Byung-Kwon Kang ; Yoon Ho Park ; Seok Lee ; Sang Sam Choi ; Jungkeun Lee ; Kamiya, T. ; Seung-Han Park
Author_Institution
Dept. of Phys., Yonsei Univ., Seoul, South Korea
Volume
13
Issue
2
fYear
2001
fDate
2/1/2001 12:00:00 AM
Firstpage
112
Lastpage
114
Abstract
A new method to measure the facet reflectivity of an antireflection (AR)-coated electroabsorption (EA) modulator in the region of operating wavelengths is proposed. First, by measuring the induced photocurrent and reflectance simultaneously at the front facet of an EA waveguide, the cleaved facet reflectivity and propagation loss are determined. After coating the facet with AR, the residual reflectivity of AR-coated facet is obtained from the measured photocurrent spectra and the predetermined facet reflectivity. We demonstrate the reflectivity of a double-layer AR-coated EA modulator can be measured to be /spl sim/4×10/sup -4/ at 1.55 μm for TE polarization by using the proposed technique.
Keywords
III-V semiconductors; antireflection coatings; electro-optical modulation; electroabsorption; gallium arsenide; gallium compounds; indium compounds; optical fabrication; optical films; optical loss measurement; optical waveguide components; photoconductivity; quantum well devices; reflectivity; 1.55 mum; EA waveguide; InGaAsP-InGaAsP; TE polarization; TiO/sub 2/-SiO/sub 2/; anti-reflection-coated facet; antireflection-coated electroabsorption modulator; cleaved facet reflectivity; double-layer anti-reflection-coated electro-absorption modulator; facet reflectivity; front facet; induced photocurrent; operating wavelengths; photocurrent spectra; propagation loss; reflectance; reflectivity; residual reflectivity; Chirp modulation; Coatings; Interference; Loss measurement; Optical waveguides; Photoconductivity; Propagation losses; Reflectivity; Tellurium; Wavelength measurement;
fLanguage
English
Journal_Title
Photonics Technology Letters, IEEE
Publisher
ieee
ISSN
1041-1135
Type
jour
DOI
10.1109/68.910505
Filename
910505
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