DocumentCode :
1454451
Title :
Numerical and charge sheet models for thin-film SOI MOSFETs
Author :
Mallikarjun, C. ; Bhat, K.N.
Author_Institution :
Dept. of Electr. Eng., Indian Inst. of Technol., Madras, India
Volume :
37
Issue :
9
fYear :
1990
fDate :
9/1/1990 12:00:00 AM
Firstpage :
2039
Lastpage :
2051
Abstract :
Numerical charge sheet models applicable for all bias conditions are presented for the channel currents of long-channel SOI MOSFETs. From a comparison of the two models it is shown that the charge sheet analytic model accurately predicts the channel currents from weak to strong inversion regions. The results include analytic expressions for the drift and diffusion current components of individual channel currents, the front-gate and back-gate interaction parameter, and an analytic correlation between the surface potentials of the front and back channels when there is coupling between the two gates under nonthermal equilibrium conditions. The effect of SOI (silicon on insulator) film thickness on the drain current was investigated under different bias conditions for the back gate, and it was found that thin films are beneficial from the point of increased drain currents if the back channel is in depletion or inversion. It is also shown that, in addition to the charge coupling effects, dynamic interaction between the channels exists if the static current in one of the channels saturates
Keywords :
insulated gate field effect transistors; numerical methods; semiconductor device models; semiconductor-insulator boundaries; surface potential; thin film transistors; back-gate interaction parameter; bias conditions; channel currents; charge coupling effects; diffusion current components; drain current; drift current components; front gate interaction parameter; long-channel SOI MOSFETs; nonthermal equilibrium conditions; numerical charge sheet models; strong inversion; surface potentials; thin film transistor; weak inversion; Analytical models; Coupling circuits; Current-voltage characteristics; Design automation; MOSFETs; Predictive models; Semiconductor thin films; Thin film circuits; Transistors; Very large scale integration;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.57167
Filename :
57167
Link To Document :
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