DocumentCode
1456486
Title
Impact of the Radial Ionization Profile on SEE Prediction for SOI Transistors and SRAMs Beyond the 32-nm Technological Node
Author
Raine, Mélanie ; Hubert, Guillaume ; Gaillardin, Marc ; Artola, Laurent ; Paillet, Philippe ; Girard, Sylvain ; Sauvestre, Jean-Etienne ; Bournel, Arnaud
Author_Institution
DIF, CEA, Arpajon, France
Volume
58
Issue
3
fYear
2011
fDate
6/1/2011 12:00:00 AM
Firstpage
840
Lastpage
847
Abstract
The relative contribution of the radial ionization profile on SEE prediction is investigated using MUSCA-SEP3 , in comparison with the classical approach considering the ion track as a series of punctual charges. The new approach is validated against experimental results, for three technology generations of PDSOI transistors and for two generations of SOI SRAM cells, showing better agreement than the punctual approach. The impact of the radial approach on the evaluation of SEU cross section as compared to the punctual approach is then investigated for nanometric SOI SRAM cells, beyond the 32-nm technological node. The influence of the radial dimension of the ion track is shown to increase with technology generation. The impact of the ion mass and energy on the ratio between radial and punctual SEU cross section is also investigated.
Keywords
SRAM chips; radiation hardening (electronics); silicon-on-insulator; transistors; MUSCA-SEP; PDSOI transistors; SEE prediction; Si; multiscale single event phenomena predictive platform; nanometric SOI SRAM cell; radial ionization profile; single event effect prediction; size 32 nm; technological node; Ionization; Object oriented modeling; Random access memory; Silicon; Simulation; Transistors; Geant4; SEE prediction; heavy ions; nanometric technology; radial ionization profile;
fLanguage
English
Journal_Title
Nuclear Science, IEEE Transactions on
Publisher
ieee
ISSN
0018-9499
Type
jour
DOI
10.1109/TNS.2011.2109966
Filename
5719142
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