Scanning X-ray interferometry over a millimeter baseline

Author

Bergamin, Angelo ; Cavagnero, Giovanni ; Cordiali, Laura ; Mana, Giovanni ; Zosi, Gianfranco

Author_Institution

Ist. di Metrol. G. Colonnetti, CNR, Torino, Italy

Volume

46

Issue

2

fYear

1997

fDate

4/1/1997 12:00:00 AM

Firstpage

576

Lastpage

579

Abstract

A new translation device has been developed at the Istituto di Metrologia “G. Colonnetti” (IMGC) to improve the measurement of the (220) lattice spacing in silicon by X-ray/optical interferometry. It is capable of millimeter linear displacement and servo controls ensure picometer and nanoradian resolutions in crystal position and attitude. It has been successfully used to drive a scanning X-ray interferometer over a 2 mm displacement, thus extending by more than one order of magnitude the maximum crystal movement obtained before

Keywords

X-ray crystallography; attitude control; electromagnetic wave interferometry; elemental semiconductors; finite element analysis; lattice constants; nanotechnology; position control; servomechanisms; silicon; (220) lattice spacing; Si; active control; attitude control; crystal position control; driving system; finite element analysis; maximum crystal movement; millimeter baseline; millimeter linear displacement; nanoradian resolution; optical interferometry; picometer resolution; scanning X-ray interferometry; servo controls; silicon; translation device; Attitude control; Crystals; Drives; Lattices; Machining; Millimeter wave devices; Optical interferometry; Servosystems; Silicon; X-ray lasers;

fLanguage

English

Journal_Title

Instrumentation and Measurement, IEEE Transactions on

Publisher

ieee

ISSN

0018-9456

Type

jour

DOI

10.1109/19.571920

Filename

571920