Shape-optimized electrooptic beam scanners: analysis, design, and simulation

Author

Chiu, Yi ; Zou, Jie ; Stancil, Daniel D. ; Schlesinger, T.E.

Volume

17

Issue

1

fYear

1999

fDate

1/1/1999 12:00:00 AM

Firstpage

108

Lastpage

114

Abstract

This paper presents the analysis of a general nonrectangular electrooptic (EO) scanner and compare its performance to a rectangular device. Since the scanning sensitivity of an EO scanner is inversely proportional to its width, high sensitivity requires the device contour to be close to the ray trajectory of a beam propagating through the device. Accordingly, a shaped-optimized scanner is designed so that the beam trajectory at maximum deflection is parallel to the device contour. A beam propagation method (BPM) simulation shows the performance agrees well with the analysis

Keywords

electro-optical devices; light propagation; optical design techniques; optical scanners; ray tracing; sensitivity; EO scanner; beam propagating; beam propagation method; beam trajectory; device contour; high sensitivity; inversely proportional; maximum deflection; nonrectangular electrooptic scanner; rectangular device; scanning sensitivity; shape-optimized electrooptic beam scanner design; shaped-optimized scanner; simulation; Analytical models; Apertures; Bandwidth; Electrooptic deflectors; Electrooptic devices; Equations; Laser beams; Optical propagation; Performance analysis; Ray tracing;

fLanguage

English

Journal_Title

Lightwave Technology, Journal of

Publisher

ieee

ISSN

0733-8724

Type

jour

DOI

10.1109/50.737429

Filename

737429