• DocumentCode
    1457756
  • Title

    Overview of the electric launch technology program in China

  • Author

    Jun Lin ; Zou, Jiyan ; Wang, Ying

  • Author_Institution
    Dept. of Electr. Eng., Tsinghua Univ., Beijing, China
  • Volume
    37
  • Issue
    1
  • fYear
    2001
  • fDate
    1/1/2001 12:00:00 AM
  • Firstpage
    37
  • Lastpage
    38
  • Abstract
    Since the 9th EML technology symposium, the electric launch technology program in China has been focused on the two aspects: basic and key issues in military applications of the EML technology and civilian applications of the EML technology. The first aspect involves the investigations of the erosion of the rail electrodes at the breech, the velocity skin effort, triggered vacuum switches, the influence of electrical energy input on the combustion behavior of propellant, the best wave form of the pulsed power supply for the ETC launcher and the mathematical model and a computer simulation code of the reusable linear magnetic flux compressor for electric launchers applications. The second aspect involves the investigations of the linear electromagnetic pumping unit, which is being developed based on the EML technology and experiments were conducted to test and verify the performance of the prototype model
  • Keywords
    electrodes; electromagnetic launchers; pulsed power supplies; pulsed power switches; research initiatives; vacuum switches; China; civilian applications; computer simulation code; electric launch technology program; electric launchers; erosion; linear electromagnetic pumping unit; mathematical model; pulsed power supply; rail electrodes; reusable linear magnetic flux compressor; triggered vacuum switches; velocity skin effort; Combustion; Electrodes; Elementary particle vacuum; Magnetic switching; Propulsion; Pulse compression methods; Pulsed power supplies; Rails; Skin; Switches;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/20.911785
  • Filename
    911785