DocumentCode :
1457801
Title :
Enhancement of high-temperature high-frequency performance of GaAs-based FETs by the high-temperature electronic technique
Author :
Narasimhan, R. ; Sadwick, L.P. ; Hwu, Ruey J.
Author_Institution :
Dept. of Electr. Eng., Utah Univ., Salt Lake City, UT, USA
Volume :
46
Issue :
1
fYear :
1999
fDate :
1/1/1999 12:00:00 AM
Firstpage :
24
Lastpage :
31
Abstract :
This paper reports the effects of high temperature on high-frequency/high-speed field effect transistors (FETs), particularly GaAs-based MESFETs and HEMTs. The high-temperature electronic technique (HTET) was employed to stabilize and improve the performance of these devices at high temperatures. This work focuses on detailed high-temperature experiments of high-frequency scattering parameters of various transistors. Comparable gain level to that obtained at room temperature was achieved at elevated temperature through the use of the HTET
Keywords :
III-V semiconductors; S-parameters; Schottky gate field effect transistors; UHF field effect transistors; gallium arsenide; high electron mobility transistors; high-temperature electronics; leakage currents; microwave field effect transistors; GaAs; HEMT; HTET; MESFET; gain level; high-frequency scattering parameters; high-temperature electronic technique; Cities and towns; FETs; Leakage current; MESFETs; Micromanipulators; Probes; Scattering parameters; Substrates; Temperature; Thermal conductivity;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.737437
Filename :
737437
Link To Document :
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