Title :
Silicon-on-Insulator Polarization Rotator Based on a Symmetry Breaking Silicon Overlay
Author :
Vermeulen, Diedrik ; Selvaraja, Shankar ; Verheyen, Peter ; Absil, Philippe ; Bogaerts, Wim ; Van Thourhout, Dries ; Roelkens, Gunther
Author_Institution :
Dept. of Inf. Technol., Ghent Univ., Ghent, Belgium
fDate :
3/15/2012 12:00:00 AM
Abstract :
We demonstrate a polarization rotator fabricated using a 4 etch-step complementary metal-oxide-semiconductor (CMOS)-compatible process including layer depositions on a silicon-on-insulator wafer. The measured polarization rotation efficiency is over a wavelength range of 80 nm. A robustness investigation shows that the design is compatible with CMOS fabrication capabilities.
Keywords :
CMOS integrated circuits; chemical vapour deposition; integrated optics; light polarisation; optical fabrication; optical rotation; silicon; silicon-on-insulator; 4 etch-step; layer depositions; polarization rotation efficiency; silicon-on-insulator polarization rotator; symmetry breaking silicon overlay; wavelength 80 nm; Couplers; Fabrication; Gratings; Optical waveguides; Optimized production technology; Robustness; Silicon; Polarization rotator; silicon-on-insulator (SOI);
Journal_Title :
Photonics Technology Letters, IEEE
DOI :
10.1109/LPT.2011.2181944
