DocumentCode :
1458970
Title :
Optoelectrical Detection System Using Porous Silicon-Based Optical Multilayers
Author :
Kovacs, Andras ; Jonnalagadda, Prasad ; Mescheder, Ulrich
Author_Institution :
Inst. for Appl. Res., Hochschule Furtwangen Univ., Furtwangen, Germany
Volume :
11
Issue :
10
fYear :
2011
Firstpage :
2413
Lastpage :
2420
Abstract :
Porous silicon-based multilayer structures for optical sensors have been simulated, fabricated and tested. The properties of optical sensors using porous silicon multilayers can be adjusted by appropriate substrate material, morphology, process parameters in the pore formation process and by surface treatment (thermal oxidation). Heavily and lightly doped p-doped substrates have been used to realize porous silicon layers with different morphology, porosity (30%-80%), pore size (mesoporous range) and specific surface area (200-700 m2/cm3). Thermal oxidation stabilizes the surface and results in hydrophilic surfaces for effective adsorption of liquid analytes. Oxidation reduces the porosity and the pore size but improves the wetting behavior of liquid analytes in the porous volume. Different multilayer structures using native and oxidized porous silicon and corresponding concepts of optical sensor systems have been proved for aqueous and organic analytes. Sensors using small pore size (2-4 nm) and high porosity (70%-80%) have been realized and characterized. A simple, low cost optical sensor system based on multilayer, a LED-based illumination system providing discrete wavelengths (RGB) and a wide band detector has been realized and tested.
Keywords :
elemental semiconductors; light emitting diodes; optical multilayers; optical sensors; oxidation; photoelectric devices; porous semiconductors; silicon; surface treatment; LED based illumination system; Si; discrete wavelengths; optical sensors; optoelectrical detection system; pore formation process; porous silicon based multilayer structure; porous silicon based optical multilayers; size 2 nm to 4 nm; surface treatment; thermal oxidation; wide band detector; Current density; Distributed Bragg reflectors; Nonhomogeneous media; Oxidation; Refractive index; Silicon; Surface morphology; Optical multilayer; optoelectronic and photonic sensors; porous silicon; refractive index;
fLanguage :
English
Journal_Title :
Sensors Journal, IEEE
Publisher :
ieee
ISSN :
1530-437X
Type :
jour
DOI :
10.1109/JSEN.2011.2119310
Filename :
5720253
Link To Document :
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