• DocumentCode
    1459359
  • Title

    Modeling plasma equipment using neural networks

  • Author

    Kim, Byungwhan ; Park, Gwi Tae

  • Author_Institution
    Dept. of Electr. Eng., Chonnam Nat. Univ., Kwangju, South Korea
  • Volume
    29
  • Issue
    1
  • fYear
    2001
  • fDate
    2/1/2001 12:00:00 AM
  • Firstpage
    8
  • Lastpage
    12
  • Abstract
    Equipment plasma has been modeled semi-empirically using neural networks in conjunction with statistical experimental design. A 33 factorial design was employed to characterize the plasma, in which the variables that were varied include a source power, pressure, and Ar flow rate. As a test data for model validation, 16 experiments were additionally conducted. A total of six plasma attributes were modeled, which include electron density, electron temperature, and plasma potential as well as their spatial uniformities. A planar, inductively coupled plasma was generated in a multipole plasma etch equipment and Langmuir probe was utilized for data collection. Root mean-squared prediction errors measured on the test data are 0.323 (10 11/cm3), 0.267 (eV) and 1.141 (V) for electron density, electron temperature, and plasma potential, respectively. Comparisons with a statistical response surface model (RSM) revealed that neural network models are more accurate by an improvement of more than 25% in prediction performance. A similar level of prediction accuracy was also achieved in modeling spatial uniformity data. Consequently, neural networks demonstrated much better prediction capabilities over RSM in modeling complex equipment plasma
  • Keywords
    Langmuir probes; backpropagation; design of experiments; electron density; neural nets; plasma applications; plasma density; plasma flow; plasma pressure; plasma probes; plasma simulation; plasma temperature; 33 factorial design; Ar; Ar flow rate; Langmuir probe; complex equipment plasma; data collection; electron density; electron temperature; equipment plasma; model validation; multipole plasma etch equipment; neural network models; neural networks; planar inductively coupled plasma; plasma; plasma attributes; plasma equipment; plasma potential; prediction accuracy; prediction capabilities; prediction performance; pressure; root mean-squared prediction errors; semi-empirical modelling; source power; spatial uniformities; spatial uniformity data; statistical experimental design; statistical response surface model; test data; variables; Design for experiments; Electrons; Neural networks; Plasma applications; Plasma density; Plasma measurements; Plasma sources; Plasma temperature; Predictive models; Testing;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/27.912935
  • Filename
    912935