DocumentCode
1459359
Title
Modeling plasma equipment using neural networks
Author
Kim, Byungwhan ; Park, Gwi Tae
Author_Institution
Dept. of Electr. Eng., Chonnam Nat. Univ., Kwangju, South Korea
Volume
29
Issue
1
fYear
2001
fDate
2/1/2001 12:00:00 AM
Firstpage
8
Lastpage
12
Abstract
Equipment plasma has been modeled semi-empirically using neural networks in conjunction with statistical experimental design. A 33 factorial design was employed to characterize the plasma, in which the variables that were varied include a source power, pressure, and Ar flow rate. As a test data for model validation, 16 experiments were additionally conducted. A total of six plasma attributes were modeled, which include electron density, electron temperature, and plasma potential as well as their spatial uniformities. A planar, inductively coupled plasma was generated in a multipole plasma etch equipment and Langmuir probe was utilized for data collection. Root mean-squared prediction errors measured on the test data are 0.323 (10 11/cm3), 0.267 (eV) and 1.141 (V) for electron density, electron temperature, and plasma potential, respectively. Comparisons with a statistical response surface model (RSM) revealed that neural network models are more accurate by an improvement of more than 25% in prediction performance. A similar level of prediction accuracy was also achieved in modeling spatial uniformity data. Consequently, neural networks demonstrated much better prediction capabilities over RSM in modeling complex equipment plasma
Keywords
Langmuir probes; backpropagation; design of experiments; electron density; neural nets; plasma applications; plasma density; plasma flow; plasma pressure; plasma probes; plasma simulation; plasma temperature; 33 factorial design; Ar; Ar flow rate; Langmuir probe; complex equipment plasma; data collection; electron density; electron temperature; equipment plasma; model validation; multipole plasma etch equipment; neural network models; neural networks; planar inductively coupled plasma; plasma; plasma attributes; plasma equipment; plasma potential; prediction accuracy; prediction capabilities; prediction performance; pressure; root mean-squared prediction errors; semi-empirical modelling; source power; spatial uniformities; spatial uniformity data; statistical experimental design; statistical response surface model; test data; variables; Design for experiments; Electrons; Neural networks; Plasma applications; Plasma density; Plasma measurements; Plasma sources; Plasma temperature; Predictive models; Testing;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/27.912935
Filename
912935
Link To Document