Title :
Current Control in the Magnetron Systems for Nanofabrication: A Comparison
Author :
Yick, S. ; Levchenko, I. ; Kumar, S. ; Han, Z.J. ; Yajadda, M.M.A. ; Ostrikov, K.
Author_Institution :
CSIRO Mater. Sci. & Eng., Plasma Nanosci. Centre Australia, Lindfield, NSW, Australia
fDate :
4/1/2012 12:00:00 AM
Abstract :
A cylindrical magnetron system and a hybrid inductively coupled plasma-assisted magnetron deposition system were examined experimentally in light of their discharge characteristics with a view to stress the enhanced controllability of the hybrid system. The comparative study has shown that the hybrid magnetron the inductively coupled plasma system is a flexible, powerful, and convenient tool that has certain advantages as compared with the cylindrical dc magnetrons. In particular, the hybrid system features more linear current-voltage characteristics and the possibility of a bias-independent control of the discharge current.
Keywords :
high-frequency discharges; nanofabrication; plasma deposition; sputter deposition; bias-independent control; current control; cylindrical dc magnetrons; discharge characteristics; discharge current; hybrid inductively coupled plasma-assisted magnetron deposition system; linear current-voltage characteristics; magnetron systems; nanofabrication; stress; Discharges; Iterative closest point algorithm; Magnetic resonance imaging; Magnetomechanical effects; Nanofabrication; Plasmas; Substrates; Cylindrical dc magnetron; deposition; low-frequency inductively coupled (ICP) plasma; magnetron;
Journal_Title :
Plasma Science, IEEE Transactions on
DOI :
10.1109/TPS.2012.2185716
