Title :
Curve evolution models for real-time identification with application to plasma etching
Author :
Berg, Jordan ; Yezzi, Anthony ; Tannenbaum, Allen
Author_Institution :
Dept. of Mech. Eng., Texas Tech. Univ., Lubbock, TX, USA
Abstract :
It is desirable, in constructing an algorithm for real-time control or identification of free surfaces, to avoid representations of the surface requiring mesh refinement at corners or special logic for topological transitions. Level set methods provide a promising framework for such algorithms. In this paper we present: 1) a mathematical representation of free surface motion that is particularly well-suited to real-time implementation; 2) a technique for estimating an isotropic and homogeneous normal velocity based on a simple measurement; and 3) an application to a semiconductor etching problem.
Keywords :
parameter estimation; process control; real-time systems; semiconductor device manufacture; sputter etching; curve evolution; free surface motion; identification; level set method; parameter estimation; plasma etching; process modelling; real-time systems; semiconductor manufacturing; Etching; Level set; Logic; Motion estimation; Motion measurement; Parameter estimation; Particle measurements; Plasma applications; Plasma measurements; Velocity measurement;
Journal_Title :
Automatic Control, IEEE Transactions on