• DocumentCode
    1462183
  • Title

    Large area thin film semiconductor detectors using multichannel counting Castor readout chip

  • Author

    Hordequin, C. ; Foulon, F. ; Dulinski, W. ; Turchetta, R. ; Claus, G. ; Brambilla, A. ; Bergonzo, P.

  • Author_Institution
    CEA, Centre d´´Etudes Nucleaires de Saclay, Gif-sur-Yvette, France
  • Volume
    47
  • Issue
    6
  • fYear
    2000
  • fDate
    12/1/2000 12:00:00 AM
  • Firstpage
    1802
  • Lastpage
    1806
  • Abstract
    The performance of charged particle counters associating thin diamond or amorphous silicon (a-Si) detectors to Castor VLSI analog-digital circuits for the fabrication of large area detectors an reported. The 20 μm thick semiconductor detectors were synthesised using chemical vapour deposition (CVD) technique. Detectors of 2.5×2.5 cm2 area were segmented in 32 sub-areas of 13 mm2 in order to limit the electronic noise per reading channel. The 32 channel circuit was used to record the counting rate and the total number of counts on each segment. Such detection systems were tested under alpha particles (241Am) as well as under low energy beta particles (14C). The results show that large area detection systems can readily be fabricated at low cost by the association of an application specific readout chip (ASIC) with chemically vapour deposited semiconductor detectors
  • Keywords
    CVD coatings; VLSI; alpha-particle detection; beta-ray detection; diamond; digital readout; mixed analogue-digital integrated circuits; nuclear electronics; semiconductor counters; silicon radiation detectors; 2.5 cm; ASIC; C; CVD; Castor VLSI analog-digital circuits; Si; a-Si detectors; alpha particles; application specific readout chip; charged particle counters; chemical vapour deposition; large area thin film semiconductor detectors; low energy beta particles; multichannel counting Castor readout chip; thin diamond detectors; Amorphous silicon; Analog-digital conversion; Chemical vapor deposition; Circuit synthesis; Counting circuits; Detectors; Fabrication; Semiconductor thin films; Thin film circuits; Very large scale integration;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/23.914449
  • Filename
    914449