Title :
Development of a Versatile Physics-Based Finite-Element Model of an AlGaN/GaN HEMT Capable of Accommodating Process and Epitaxy Variations and Calibrated Using Multiple DC Parameters
Author :
Heller, Eric R. ; Vetury, Rama ; Green, Daniel S.
Author_Institution :
Mater. Directorate, Air Force Res. Lab., Wright-Patterson AFB, OH, USA
fDate :
4/1/2011 12:00:00 AM
Abstract :
We present a physics-based finite-element model of operation of an AlGaN/GaN HEMT with device geometry inputs taken from transmission electron microscope cross sections and calibrated by comparison with measured electrical data comprising standard field-effect transistor metrics and less well-known model parameters. A variety of electrical outputs from the model are compared to experiment, and the level of agreement is reported.
Keywords :
III-V semiconductors; aluminium compounds; calibration; finite element analysis; gallium compounds; high electron mobility transistors; semiconductor device measurement; semiconductor device models; transmission electron microscopy; wide band gap semiconductors; AlGaN-GaN; HEMT; calibration; epitaxy variation; field-effect transistor; multiple DC parameter; physics-based finite-element model; transmission electron microscope cross-section; Aluminum gallium nitride; Data models; Gallium nitride; HEMTs; Logic gates; Mathematical model; Semiconductor device modeling; Device model; GaN; GaN/AlGaN; field-effect transistor (FET); high-electron mobility transistor (HEMT); model calibration; model characterization; modulation-doped field effect transistor (MODFET);
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/TED.2011.2107913