Title :
Low-operation voltage of InGaN/GaN light-emitting diodes by using a Mg-doped Al/sub 0.15/Ga/sub 0.85/N/GaN superlattice
Author :
Sheu, J.K. ; Chi, G.C. ; Jou, M.J.
Author_Institution :
Opt. Sci. Centre, Nat. Central Univ., Chung-Li, Taiwan
fDate :
4/1/2001 12:00:00 AM
Abstract :
Low-resistivity Mg-doped Al/sub 0.15/Ga/sub 0.85/N/GaN strained-layer superlattices were grown. In these superlattices, the maximum hole concentration is 3/spl times/10/sup 18//cm/sup 3/ at room temperature. Hall-effect measurements indicate high conductivity of this structure in which the high activation efficiency is attributed to the strain-induced piezoelectric fields. This work also fabricated InGaN/GaN blue LEDs that consist of a Mg-doped Al/sub 0.15/Ga/sub 0.85/N/GaN SLs. Experimental results indicate that the LEDs can achieve a lower operation voltage of around 3 V, i.e., smaller than conventional devices which have an operation voltage of about 3.8 V.
Keywords :
Hall effect; III-V semiconductors; MOCVD; aluminium compounds; gallium compounds; indium compounds; light emitting diodes; low-power electronics; magnesium; piezoelectric semiconductors; semiconductor superlattices; wide band gap semiconductors; 3 V; Al/sub 0.15/Ga/sub 0.85/N:Mg-GaN; Hall-effect measurements; InGaN-GaN; InGaN/GaN blue LEDs; InGaN/GaN light-emitting diodes; MOVPE; Mg-doped Al/sub 0.15/Ga/sub 0.85/N/GaN superlattice; activation efficiency; high conductivity; low operation voltage; maximum hole concentration; room temperature; strain-induced piezoelectric fields; strained-layer superlattices; Aluminum gallium nitride; Epitaxial growth; Epitaxial layers; Gallium nitride; Laser sintering; Light emitting diodes; Optical films; Optical superlattices; Temperature measurement; Voltage;
Journal_Title :
Electron Device Letters, IEEE