DocumentCode :
1464706
Title :
Modeling of the parasitic transistor-induced drain breakdown in MOSFETs
Author :
Wong, Hei
Author_Institution :
Dept. of Electron. Eng., City Univ. of Hong Kong, Kowloon, Hong Kong
Volume :
43
Issue :
12
fYear :
1996
fDate :
12/1/1996 12:00:00 AM
Firstpage :
2190
Lastpage :
2196
Abstract :
Parasitic bipolar transistor (PET) induced breakdown characteristics in MOSFETs are investigated and modeled with the aid of MINIMOS simulation. Formula for approximating the breakdown voltage is also developed. The proposed model agrees well with the MINIMOS simulation results, especially in the bias, temperature, and substrate resistance dependencies. According to the simulation and theoretical results, the breakdown voltage for the PET-induced breakdown can be increased by raising the temperature, increasing the channel length, and reducing the substrate resistance
Keywords :
MOSFET; electric breakdown; semiconductor device models; MINIMOS simulation; MOSFET; breakdown characteristics; breakdown voltage approximation; channel length; parasitic bipolar transistor; parasitic transistor-induced drain breakdown; substrate resistance; Avalanche breakdown; Bipolar transistors; Breakdown voltage; Charge carrier processes; Cities and towns; Current measurement; Electric breakdown; Electrons; Impact ionization; MOSFET circuits; MOSFETs; Positron emission tomography; Temperature dependence; Thermal resistance;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.544391
Filename :
544391
Link To Document :
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