• DocumentCode
    1464944
  • Title

    Dynamics of heavy-ion-induced latchup in CMOS structures

  • Author

    Aoki, Takahiro

  • Author_Institution
    NTT LSI Lab., Kanagawa, Japan
  • Volume
    35
  • Issue
    11
  • fYear
    1988
  • fDate
    11/1/1988 12:00:00 AM
  • Firstpage
    1885
  • Lastpage
    1891
  • Abstract
    Heavy-ion-particle-induced latchup phenomenon in CMOS parasitic p-n-p-n structures is analyzed using a two-dimensional transient device simulator. In the study, the dynamics of the latchup turn-on behavior in a conventional bulk structure are investigated in detail. Moreover, the relation between the terminal currents and the behavior of inner variables such as carriers and potential is also described. Relative latchup immunity for several device structures is also studied. From the points of the decoupling of the parasitic n-p-n and p-n-p transistors, which is the key factor for preventing latchup, the p--p+ epitaxial wafer with and without guard bands is discussed in comparison with the conventional structure
  • Keywords
    CMOS integrated circuits; integrated circuit technology; ion beam effects; CMOS parasitic p-n-p-n structures; dynamics; heavy-ion-induced latchup; latchup immunity; latchup turn-on behavior; p--p+ epitaxial wafer; parasitic transistors; terminal currents; two-dimensional transient device simulator; Analytical models; Charge carrier processes; Circuits; Guidelines; Large scale integration; Numerical simulation; Poisson equations; Semiconductor diodes; Single event upset; Thyristors;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.7401
  • Filename
    7401