DocumentCode :
1464955
Title :
Reverse leakage current calculations for SiC Schottky contacts
Author :
Crofton, J. ; Sriram, S.
Author_Institution :
Dept. of Phys. & Astron., Murray State Univ., KY, USA
Volume :
43
Issue :
12
fYear :
1996
fDate :
12/1/1996 12:00:00 AM
Firstpage :
2305
Lastpage :
2307
Abstract :
Reverse leakage current calculations are a function of Schottky barrier height and temperature have been performed for metal gates on n-type 6H-SiC. These calculations were performed using a WKB evaluation of the tunneling probability through a reverse biased Schottky barrier and numerically integrating over all energies to find the reverse current density. This method is shown to yield much better agreement with previously published reverse leakage currents on 6H-SiC than can be obtained using thermionic emission theory
Keywords :
Schottky barriers; Schottky diodes; WKB calculations; leakage currents; semiconductor materials; semiconductor-metal boundaries; silicon compounds; tunnelling; Schottky barrier height; Schottky contact; SiC; WKB method; metal gate; n-type 6H-SiC; reverse leakage current; thermionic emission; tunneling probability; Breakdown voltage; Current density; Electron devices; Impact ionization; Leakage current; Performance evaluation; Probability; Schottky barriers; Schottky diodes; Silicon carbide; Temperature; Thermionic emission; Tunneling;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.544427
Filename :
544427
Link To Document :
بازگشت