DocumentCode
1464955
Title
Reverse leakage current calculations for SiC Schottky contacts
Author
Crofton, J. ; Sriram, S.
Author_Institution
Dept. of Phys. & Astron., Murray State Univ., KY, USA
Volume
43
Issue
12
fYear
1996
fDate
12/1/1996 12:00:00 AM
Firstpage
2305
Lastpage
2307
Abstract
Reverse leakage current calculations are a function of Schottky barrier height and temperature have been performed for metal gates on n-type 6H-SiC. These calculations were performed using a WKB evaluation of the tunneling probability through a reverse biased Schottky barrier and numerically integrating over all energies to find the reverse current density. This method is shown to yield much better agreement with previously published reverse leakage currents on 6H-SiC than can be obtained using thermionic emission theory
Keywords
Schottky barriers; Schottky diodes; WKB calculations; leakage currents; semiconductor materials; semiconductor-metal boundaries; silicon compounds; tunnelling; Schottky barrier height; Schottky contact; SiC; WKB method; metal gate; n-type 6H-SiC; reverse leakage current; thermionic emission; tunneling probability; Breakdown voltage; Current density; Electron devices; Impact ionization; Leakage current; Performance evaluation; Probability; Schottky barriers; Schottky diodes; Silicon carbide; Temperature; Thermionic emission; Tunneling;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.544427
Filename
544427
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