• DocumentCode
    1464955
  • Title

    Reverse leakage current calculations for SiC Schottky contacts

  • Author

    Crofton, J. ; Sriram, S.

  • Author_Institution
    Dept. of Phys. & Astron., Murray State Univ., KY, USA
  • Volume
    43
  • Issue
    12
  • fYear
    1996
  • fDate
    12/1/1996 12:00:00 AM
  • Firstpage
    2305
  • Lastpage
    2307
  • Abstract
    Reverse leakage current calculations are a function of Schottky barrier height and temperature have been performed for metal gates on n-type 6H-SiC. These calculations were performed using a WKB evaluation of the tunneling probability through a reverse biased Schottky barrier and numerically integrating over all energies to find the reverse current density. This method is shown to yield much better agreement with previously published reverse leakage currents on 6H-SiC than can be obtained using thermionic emission theory
  • Keywords
    Schottky barriers; Schottky diodes; WKB calculations; leakage currents; semiconductor materials; semiconductor-metal boundaries; silicon compounds; tunnelling; Schottky barrier height; Schottky contact; SiC; WKB method; metal gate; n-type 6H-SiC; reverse leakage current; thermionic emission; tunneling probability; Breakdown voltage; Current density; Electron devices; Impact ionization; Leakage current; Performance evaluation; Probability; Schottky barriers; Schottky diodes; Silicon carbide; Temperature; Thermionic emission; Tunneling;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.544427
  • Filename
    544427