DocumentCode
1465306
Title
Error analysis leading to design criteria for transmission line model characterization of ohmic contacts
Author
Ueng, Haw-Jye ; Janes, David B. ; Webb, Kevin J.
Author_Institution
Sch. of Electr. & Comput. Eng., Purdue Univ., West Lafayette, IN, USA
Volume
48
Issue
4
fYear
2001
fDate
4/1/2001 12:00:00 AM
Firstpage
758
Lastpage
766
Abstract
The transmission line model (TLM) is a standard method for planar specific contact resistance measurement. Although widely used, the accuracy of a measurement is typically not stated. In addition to contributions from random errors, there can be substantial contributions from systematic errors in typical TLM measurements. In this paper, we develop an analytical model for the experimental uncertainty from the fundamental TLM expressions in order to understand and calculate the uncertainty associated with the specific contact resistance and sheet resistance derived by the TLM method. The experimental uncertainties in measured resistances, together with the pad width and pad spacing, are the dominant contributions to the total uncertainty. Analytical expressions for relative random and systematic uncertainties in contact resistance and sheet resistance are developed in terms of the error contributions and the parameters of the TLM geometry. Expressions for minimum uncertainty, with associated optimum widths and sheet resistances, serve as a basis for the design of TLM structures with minimum uncertainty. The model quantifies the increase in relative uncertainty associated with decreasing contact resistance. Simulations of uncertainty under various sheet resistance, contact resistance, and pad width are implemented and uncertainties are calculated for realistic data sets
Keywords
contact resistance; electric resistance measurement; measurement errors; measurement uncertainty; ohmic contacts; transmission line theory; error analysis; measurement uncertainty; ohmic contact; random error; sheet resistance; specific contact resistance; systematic error; transmission line model; Analytical models; Contact resistance; Electrical resistance measurement; Error analysis; Geometry; Measurement standards; Measurement uncertainty; Planar transmission lines; Transmission line measurements; Transmission lines;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.915721
Filename
915721
Link To Document