DocumentCode :
14656
Title :
Analysis of Removal of Surface-State-Related Lags and Current Slump in GaAs FETs
Author :
Hafiz, H. ; Kumeno, M. ; Horio, K.
Author_Institution :
Fac. of Syst. Eng., Shibaura Inst. of Technol., Saitama, Japan
Volume :
34
Issue :
11
fYear :
2013
fDate :
Nov. 2013
Firstpage :
1361
Lastpage :
1363
Abstract :
Two-dimensional transient analysis of field-plate GaAs MESFETs is performed by considering surface states in the region from the gate toward the drain. Quasi-pulsed current-voltage curves are derived from the transient characteristics. It is shown that drain lag and current slump because of surface states are reduced by introducing a field plate longer than the surface-state region. Dependence of drain lag, gate lag, and current slump on the field-plate length and SiO2 passivation layer thickness is studied, indicating that the lags and current slump can be completely removed in a case with a thin SiO2 layer.
Keywords :
III-V semiconductors; Schottky gate field effect transistors; gallium arsenide; silicon compounds; surface states; transient analysis; FET; GaAs; SiO2; current slump; drain lag; field-plate length; gate lag; passivation layer thickness; quasipulsed voltage curves; surface-state-related lags removal; two-dimensional transient analysis; Current slump; Gallium arsenide; Gallium nitride; HEMTs; Logic gates; MODFETs; Transient analysis; 2-D analysis; GaAs field effect transistor (FET); current slump; drain lag; gate lag; surface state;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2013.2279833
Filename :
6603270
Link To Document :
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