DocumentCode
146853
Title
Piezoresistive MEMS pressure sensors using Si, Ge, and SiC diaphragms: A VLSI layout optimization
Author
Megalingam, Rajesh Kannan ; Lal, Lekshmi S.
Author_Institution
Dept. of Electron. & Commun. Eng., Amrita Vishwa Vidyapeetham, Kollam, India
fYear
2014
fDate
3-5 April 2014
Firstpage
597
Lastpage
601
Abstract
The work presented in this paper relates to optimizing the VLSI layout geometry of a Piezoresistive MEMS Pressure Sensors. MEMS is the technology of miniaturizing mechanical devices with the aid of Electrical support. The study is conducted through the analysis of diaphragms made out of semiconductor and insulator materials. The Piezoresistive property of materials are used here where the resistivity of the material changes on application of pressure. The optimal diaphragm shape is decided by studying the deflection, stress, and output voltage. Three different shapes are considered for the studies, Circular, Square, and Rectangular. The stress, deflection, and output voltage are analyzed using COMSOL Multiphysics software and the observed results are included in the paper.
Keywords
VLSI; circuit optimisation; elemental semiconductors; germanium; integrated circuit layout; microsensors; piezoresistive devices; pressure sensors; silicon; silicon compounds; wide band gap semiconductors; COMSOL Multiphysics software; Ge; Si; SiC; VLSI layout optimization; electrical support; insulator materials; mechanical devices; optimal diaphragm shape; piezoresistive MEMS pressure sensors; piezoresistive property; semiconductor materials; Layout; Mechanical sensors; Shape; Silicon; Stress; Deflection; Diaphragm; MEMS; Piezoresistivity; Pressure; Stress;
fLanguage
English
Publisher
ieee
Conference_Titel
Communications and Signal Processing (ICCSP), 2014 International Conference on
Conference_Location
Melmaruvathur
Print_ISBN
978-1-4799-3357-0
Type
conf
DOI
10.1109/ICCSP.2014.6949911
Filename
6949911
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