Title :
Stable single-mode operation of an 850-nm VCSEL with a higher order mode absorber formed by shallow Zn diffusion
Author :
Chen, Choon Chowe ; Liaw, S.J. ; Yang, Y.J.
Author_Institution :
Dept. of Electr. Eng., Nat. Taiwan Univ., Taipei, Taiwan
fDate :
4/1/2001 12:00:00 AM
Abstract :
We report that an 850-nm vertical-cavity surface-emitting laser with a planar higher order mode absorber, formed by shallow Zn diffusion (<0.3 μm), operated at stable single-mode over the entire drive current range. A device with a 5×5 μm2 absorber aperture and a 5×5 μm2 oxide confined active region showed a /spl sim/0.8 mA threshold and a mode suppression ratio of 40 dB. The modeling indicates that the higher order modes will be suppressed strongly due to the much larger threshold gain, compared to that of the fundamental mode as long as the Zn diffusion depth outside the 5×5 μm2 absorber aperture is over /spl sim/0.2 μm, which agrees well with the experimental results.
Keywords :
III-V semiconductors; aluminium compounds; diffusion; gallium arsenide; infrared sources; integrated optics; laser modes; laser stability; laser transitions; light absorption; quantum well lasers; surface emitting lasers; 0.2 micron; 0.8 mA; 5 mum; 850 nm; 850-nm VCSEL; GaAs-AlGaAs; Zn; Zn diffusion depth; absorber aperture; drive current range; fundamental mode; higher order mode absorber; larger threshold gain; mA threshold; mode suppression ratio; oxide confined active region; planar higher order mode absorber; shallow Zn diffusion; stable single-mode; stable single-mode operation; vertical-cavity surface-emitting laser; Apertures; Distributed Bragg reflectors; Etching; Laser modes; Optical arrays; Optical interconnections; Surface emitting lasers; Threshold current; Vertical cavity surface emitting lasers; Zinc;
Journal_Title :
Photonics Technology Letters, IEEE