DocumentCode :
1469840
Title :
Influence of accumulation layer on interface trap density extraction
Author :
Sonnenberg, V. ; Martino, J.A.
Author_Institution :
Escola Politecnica, Sao Paulo Univ., Brazil
Volume :
34
Issue :
25
fYear :
1998
fDate :
12/10/1998 12:00:00 AM
Firstpage :
2439
Lastpage :
2441
Abstract :
The accumulation layer effect in the subthreshold slope of silicon-on-insulator nMOSFETs and in the extraction of the front and back interface trap densities is analysed by simulation. A simple method for minimising this effect is developed and applied experimentally
Keywords :
MOSFET; accumulation layers; interface states; semiconductor device models; silicon-on-insulator; accumulation layer; interface trap density; parameter extraction; silicon-on-insulator nMOSFET; simulation; subthreshold slope;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19981678
Filename :
744037
Link To Document :
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