DocumentCode
1470007
Title
Light sources for wavelengths >2 μm grown by MBE on InP using a strain relaxed buffer
Author
Krier, A. ; Chubb, D. ; Krier, S.E. ; Hopkinson, Mark ; Hill, G.
Author_Institution
Dept. of Phys., Lancaster Univ., UK
Volume
145
Issue
5
fYear
1998
fDate
10/1/1998 12:00:00 AM
Firstpage
292
Lastpage
296
Abstract
Light emitting diodes (LEDs) and lasers operating in the 2 to 3 μm spectral region at room temperature are been demonstrated. The devices were fabricated from InxGa1-xAs/InAsy P1-y double heterostructures grown on n-type InP (100) substrates by molecular beam epitaxy. A strain relaxed buffer layer which incorporates composition reversals was used to reduce the threading dislocation density and to accommodate the large lattice mismatch (up to 2.7%) between the InP substrate and the device active region. Efficient electroluminescence emission at wavelengths between 2 and 3 μm was obtained from the LEDs at room temperature, while diode lasers exhibited coherent emission in the range 2-2.6 μm at temperatures up to 130 K. For one of the LEDs a characteristic absorption was readily observed at 2.7 μm in the diode electroluminescence emission spectrum, corresponding to strong water vapour absorption in the atmosphere. These devices could easily form the key component of an infrared gas sensor for water vapour detection and monitoring at 2.7 μm in a variety of different applications
Keywords
III-V semiconductors; electroluminescence; gallium arsenide; gas sensors; indium compounds; infrared sources; laser transitions; light emitting diodes; measurement by laser beam; molecular beam epitaxial growth; monitoring; semiconductor lasers; 2 to 3 mum; 2.7 mum; InxGa1-xAs/InAsyP1-y double heterostructures; InGaAs-InAsP; InP; InP substrate; LEDs; MBE growth; active region; characteristic absorption; coherent emission; composition reversals; diode electroluminescence emission spectrum; diode lasers; efficient electroluminescence emission; infrared gas sensor; large lattice mismatch; light emitting diodes; light sources; molecular beam epitaxy; monitoring; n-type InP (100) substrates; room temperature; semiconductor lasers; strain relaxed buffer; strain relaxed buffer layer; strong water vapour absorption; threading dislocation density; water vapour detection;
fLanguage
English
Journal_Title
Optoelectronics, IEE Proceedings -
Publisher
iet
ISSN
1350-2433
Type
jour
DOI
10.1049/ip-opt:19982308
Filename
744063
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